Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays

Abstract

An apparatus for patterning an array of SLM mirrors with a phase step is disclosed. The apparatus includes a spatial light modulator (SLM) mirror, and a mask. The mask includes a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.

1 . An apparatus for manufacturing a lithography system, comprising: 
 a spatial light modulator (SLM) mirror; and    a mask having a plurality of openings formed therein,    wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.    
   
   
       2 . The apparatus of  claim 1 , wherein the openings have a width of approximately 3 micrometers and a length of approximately 20 micrometers.  
   
   
       3 . The apparatus of  claim 1 , wherein the material comprises one of an ion beam and a reactive ion beam.  
   
   
       4 . The apparatus of  claim 3 , wherein the reactive ion beam is substantially more reactive with a reflective coating of the SLM mirror than the mask.  
   
   
       5 . The apparatus of  claim 1 , wherein the material comprises aluminum that is deposited on the SLM mirror.  
   
   
       6 . The apparatus of  claim 1 , wherein the SLM mirror is one of a plurality of SLM mirrors included in an array of SLM mirrors, and the apparatus further comprises: 
 a stepper that moves the array of SLM mirrors in discrete steps along a first direction,    wherein, at each discrete step, the material is passed through the first opening in the mask to cause the material to impinge upon a predetermined area of another SLM mirror in the array of SLM mirrors that is aligned with the first opening, whereby a phase step is formed on the other SLM mirror aligned with the first opening.