US2008034563A1PendingUtilityA1

Manufacturing method of actuator device and liquid jet apparatus provided wirth actuator device formed by manufacturing method of the same

Assignee: SEIKO EPSON CORPPriority: Aug 12, 2003Filed: Jul 18, 2007Published: Feb 14, 2008
Est. expiryAug 12, 2023(expired)· nominal 20-yr term from priority
B41J 2/1623Y10T29/49401B41J 2/1632Y10T29/42B41J 2/1646B41J 2/161B41J 2/1635B41J 2002/14241B41J 2/1629H10N 30/2047H10N 30/8554H10N 30/00H10N 30/074H10N 30/079
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Claims

Abstract

A manufacturing method of a liquid jet head having increased the durability and reliability thereof by preventing delamination of a vibration plate is provided. At least the following two steps are included: a vibration plate forming step which includes at least a step of forming a zirconium layer on one side of a passage-forming substrate by sputtering so that a degrees of orientation to a (002) plane of the surface becomes equal to 80% or more, as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.

Claims

exact text as granted — not AI-modified
1 . A manufacturing method of an actuator device including a vibration plate, and piezoelectric elements formed of a lower electrode, a piezoelectric layer, and an upper electrode, which are formed on the vibration plate, the manufacturing method comprising at least: 
 a vibration plate forming step of forming a vibration plate, which includes at least a step of forming a zirconium layer on one side of a substrate by sputtering so that a degrees of orientation to a (002) plane of a surface becomes equal to 80% or more as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and    a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.    
     
     
         2 . The manufacturing method of an actuator device according to  claim 1 , 
 wherein the vibration plate forming step further comprises a step of forming an elastic film made of silicon dioxide (SiO 2 ) and constituting a part of the vibration plate on one side of the substrate made of a single crystal silicon substrate, and    wherein the insulation film is formed on the elastic film.    
     
     
         3 . The manufacturing method of an actuator device according to  claim 1 , 
 wherein the piezoelectric element forming step comprises at least a step of forming a piezoelectric layer made of lead zirconate titanate (PZT).    
     
     
         4 . The manufacturing method of an actuator device according to  claim 1 , 
 wherein the zirconium layer is formed by use of a DC sputtering method in a step of forming the insulation film.    
     
     
         5 . The manufacturing method of an actuator device according to  claim 4 , 
 wherein sputtering output in forming the zirconium layer is set to 500 W or below.    
     
     
         6 . The manufacturing method of an actuator device according to  claim 4 , 
 wherein a heating temperature in forming the zirconium layer is set to 100 degrees C. or more.    
     
     
         7 . The manufacturing method of an actuator device according to  claim 4 , 
 wherein sputtering pressure in forming the zirconium layer is set to 0.5 Pa or below.    
     
     
         8 . The manufacturing of an actuator device according to  claim 1 , 
 wherein a temperature of thermal oxidation is set to 850 to 1000° C., and a load speed is set to 300 mm/min or more.    
     
     
         9 . A liquid jet apparatus comprising: 
 the liquid jet head having the actuator device formed by the manufacturing method according to  claim 1.

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