Systems and methods for depositing material onto microfeature workpieces in reaction chambers

Abstract

Systems and methods for depositing material onto a microfeature workpiece in a reaction chamber are disclosed herein. In one embodiment, the system includes a gas supply assembly having a first gas source, a first gas conduit coupled to the first gas source, a first valve assembly, a reaction chamber, and a gas distributor carried by the reaction chamber. The first valve assembly includes first and second valves that are in fluid communication with the first gas conduit. The first and second valves are configured in a parallel arrangement so that the first gas flows through the first valve and/or the second valve. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

1 . A system for depositing material onto a microfeature workpiece in a reaction chamber, the system comprising: 
 a gas supply assembly having a first gas source for containing a first gas;    a first gas conduit coupled to the first gas source;    a first valve assembly including first and second valves in fluid communication with the first gas conduit, the first and second valves configured in a parallel arrangement so that the first gas flows through the first valve and/or the second valve;    a reaction chamber; and    a gas distributor carried by the reaction chamber and in fluid communication with the first valve assembly.    
   
   
       2 . The system of  claim 1 , further comprising a controller configured to operate the first and second valves in an alternating sequence.  
   
   
       3 . The system of  claim 1 , further comprising a controller configured to operate the first and second valves at least partially simultaneously.  
   
   
       4 . The system of  claim 1  wherein the first valve assembly further comprises first and second gas passageways in fluid communication with the first gas conduit, the first valve being configured to control the first gas flow through the first passageway, and the second valve being configured to control the first gas flow through the second passageway.  
   
   
       5 . The system of  claim 1  wherein the first valve assembly further comprises a third valve in fluid communication with the first gas conduit, the first, second, and third valves being arranged symmetrically so that the first, second, and third valves are spaced apart from a portion of the gas distributor by at least approximately the same distance.  
   
   
       6 . The system of  claim 1  wherein the gas supply assembly further comprises a second gas source for containing a second gas, and wherein the system further comprises: 
 a second gas conduit coupled to the second gas source and in fluid communication with the gas distributor; and    a second valve assembly including third and fourth valves in fluid communication with the second gas conduit, the third and fourth valves being configured in a parallel arrangement so that the second gas flows through the third valve and/or the fourth valve.    
   
   
       7 . A system for depositing material onto a microfeature workpiece in a reaction chamber, the system comprising: 
 a gas supply assembly having a first gas source containing a first gas;    a first gas conduit coupled to the first gas source;    a first valve and a second valve each in fluid communication with the first gas conduit, the first and second valves being operable independently to individually and/or jointly provide pulses of the first gas downstream from the first and second valves;    a reaction chamber; and    a gas distributor carried by the reaction chamber and in fluid communication with the first and second valves to receive the pulses of the first gas.    
   
   
       8 . The system of  claim 7 , further comprising a controller configured to operate the first and second valves in an alternating sequence.  
   
   
       9 . The system of  claim 7 , further comprising a controller configured to operate the first and second valves simultaneously.  
   
   
       10 . The system of  claim 7 , further comprising first and second gas passageways coupled to the first gas conduit, the first valve configured to control the first gas flow through the first passageway, and the second valve configured to control the first gas flow through the second passageway.  
   
   
       11 . The system of  claim 7 , further comprising a third valve in fluid communication with the first gas conduit, the first, second, and third valves being arranged symmetrically so that the first, second, and third valves are spaced apart from a portion of the gas distributor by at least approximately the same distance.  
   
   
       12 . The system of  claim 7  wherein the gas supply assembly further comprises a second gas source for containing a second gas, and wherein the system further comprises: 
 a second gas conduit coupled to the second gas source and in fluid communication with the gas distributor; and    a third valve and a fourth valve each in fluid communication with the second gas conduit, the third and fourth valves being operable independently to individually and/or jointly provide pulses of the second gas downstream from the third and fourth valves.    
   
   
       13 . A system for depositing material onto a microfeature workpiece in a reaction chamber, the system comprising: 
 a gas supply assembly having a first gas source for providing a first gas;    a first gas conduit coupled to the first gas source to carry the first gas from the first gas source;    a valve assembly including a body with first and second gas passageways in fluid communication with the first gas conduit, a first valve stem configured to control the flow of the first gas through the first gas passageway, and a second valve stem configured to control the flow of the first gas through the second gas passageway, the first and second gas passageways configured in a parallel arrangement;    a reaction chamber; and    a gas distributor carried by the reaction chamber and in fluid communication with the first gas conduit.    
   
   
       14 . The system of  claim 13 , further comprising a controller configured to operate the first and second valve stems in an alternating sequence.  
   
   
       15 . The system of  claim 13 , further comprising a controller configured to operate the first and second valve stems simultaneously.  
   
   
       16 . The system of  claim 13  wherein: 
 the body of the valve assembly further comprises a third gas passageway in fluid communication with the first gas conduit; and    the valve assembly further comprises a third valve stem configured to control the flow of the first gas through the third gas passageway.    
   
   
       17 . The system of  claim 13  wherein: 
 the valve assembly comprises a first valve assembly;    the body comprises a first body;    the gas supply assembly further comprises a second gas source for providing a second gas; and    the system further comprises—
 a second gas conduit coupled to the second gas source and in fluid communication with the gas distributor; and  
   a second valve assembly including a second body having third and fourth gas passageways in fluid communication with the second gas conduit, a third valve stem configured to control the flow of the second gas through the third gas passageway, and a fourth valve stem configured to control the flow of the second gas through the fourth gas passageway, the third and fourth gas passageways configured in a parallel arrangement.    
   
   
       18 - 39 . (canceled)