Apparatus to Modify the Spatial Response of a Pattern Generator

Abstract

Systems and methods are used to modify a layer on a substrate that is used to form a pattern generator, so that light reflecting from the modified substrate has a trapezoidal or other custom profile. The layer is modified using various vapor deposition techniques in conjunction with moving or positioning the substrate a desired distance from a blocking device and/or at a desired rate or speed.

1 . An apparatus, comprising: 
 means for directing a material towards a layer of pattern generator device to form a coating on the layer;    means for blocking at least some of the material from reaching the layer, such that a shape of light reflecting from the coating on the pattern generator device is trapezoidal.    
   
   
       2 . The apparatus of  claim 1 , wherein the material is generated using a vapor deposition system.  
   
   
       3 . The apparatus of  claim 1 , wherein the material is generated using a physical vapor deposition system.  
   
   
       4 . The apparatus of  claim 1 , wherein the material is generated using a photochemical vapor deposition system.  
   
   
       5 . The apparatus of  claim 1 , further comprising: 
 means for moving the pattern generator device, such that the pattern generator device is maintained parallel to the means for blocking.    
   
   
       6 . The apparatus of  claim 5 , further comprising: 
 means for controlling a rate of the means for moving to control a thickness of the coating.    
   
   
       7 . The apparatus of  claim 5 , further comprising: 
 means for controlling exposure characteristics of the material to control a thickness of the coating.    
   
   
       8 . The apparatus of  claim 7 , wherein the material is generated using a physical vapor deposition system.  
   
   
       9 . The apparatus of  claim 1 , wherein the pattern generator device is positioned along a plane that forms an acute angle with respect to an edge of the means for blocking.  
   
   
       10 . The apparatus of  claim 9 , wherein the material is generated using a physical vapor deposition system.  
   
   
       11 . The apparatus of  claim 1 , wherein the pattern generator device is maintained substantially stationary, spaced from, and parallel to the means for blocking, such that there is a gap between the pattern generator device and the means for blocking.  
   
   
       12 . The apparatus of  claim 11 , wherein a size of the gap is substantially constant in a direction along a longitudinal axis of the means for blocking.  
   
   
       13 . The apparatus of the  claim 11 , wherein a size of the gap continuously increases in a direction along a longitudinal axis of the means for blocking.  
   
   
       14 . The apparatus of  claim 11 , wherein a thickness of the coating varies around an edge of the means for blocking.  
   
   
       15 . The apparatus of  claim 14 , wherein the edge of the means for blocking causes a shadowing effect in the coating.  
   
   
       16 . The apparatus of  claim 1 , wherein the blocking device is positioned to cover a substantially central layer area of the pattern generator device.  
   
   
       17 . The apparatus of  claim 16 , wherein the material is generated using a photochemical vapor deposition system.  
   
   
       18 . The apparatus of  claim 1 , wherein the blocking device is positioned to act as a pupil stop.