US2007264748A1PendingUtilityA1

Aligned polymers for an organic tft

Assignee: UNIV CAMBRIDGE TECHPriority: Jun 21, 1999Filed: Jul 23, 2007Published: Nov 15, 2007
Est. expiryJun 21, 2019(expired)· nominal 20-yr term from priority
H10K 10/466H10K 10/468H10K 85/115H10K 85/731H10K 85/151H10K 71/191H10K 85/624H10K 85/615H10K 85/113H10K 10/464H10K 71/211Y10T428/3154Y10T428/31504C09K 2323/06C09K 2323/00C09K 2323/02Y10T428/21
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Claims

Abstract

A method for forming an electronic device having a semiconducting active layer comprising a polymer, the method comprising aligning the chains of the polymer parallel to each other by bringing the polymer into a liquid-crystalline phase.

Claims

exact text as granted — not AI-modified
1 . A method for forming a transistor comprising the step of forming an active interface of the transistor between a semiconductive layer and a gate insulator layer by solution deposition of a second polymer layer on top of a solution-processed polymer layer that has not been converted into an insoluble form prior to the deposition of the second polymer layer.  
     
     
         2 . A method as claimed in  claim 1  wherein the second layer forms the gate insulator of the transistor.  
     
     
         3 . A method as claimed in  claim 1 , wherein the second layer comprises PVP.  
     
     
         4 . A method as claimed in  claim 1 , wherein the said semiconductive layer is the said solution-processed polymer layer.  
     
     
         5 . A method as claimed in  claim 1 , wherein the said solution-processed polymer layer is soluble in a non-polar organic solvent, but is insoluble in a polar solvent.  
     
     
         6 . A method as claimed in claim  57  wherein the second polymer layer is deposited from a polar organic solvent, in which the said solution-processed polymer layer is not soluble.  
     
     
         7 . A method as claimed in  claim 1 , wherein the second polymer layer is deposited from an alcohol, a protic polar solvent such as water or an aprotic polar solvent such as DMF.  
     
     
         8 . A method as claimed in  claim 1 , wherein a source-drain and/or gate electrode of the transistor is also formed from solution.  
     
     
         9 . A method according to  claim 1 , wherein the second layer is the gate insulator layer, and the solution-processed polymer layer is a uniaxially aligned liquid crystal polymer film.

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