Chemical sensor element and method for fabricating the same

Abstract

A chemical sensor that utilizes localized surface Plasmon resonance including a substrate, metal-containing particles and dielectric particles, wherein the metal-containing particles and the dielectric particles are disposed on the substrate, is used as a chemical sensor element. Thereby, a chemical sensor element having a sufficient detecting sensitivity when localized surface Plasmon resonance is utilized, and a method for the fabrication thereof can be provided.

1 . A chemical sensor element for determining a property of a liquid specimen comprising:
 a substrate, metal-containing particles and dielectric particles, wherein   the metal-containing particles and the dielectric particles are disposed on the substrate.   
     
     
         2 . The chemical sensor element according to  claim 1 , wherein the diameter of the metal-containing particles is in the range of 1 nm to 1000 nm, and the diameter of the dielectric particles is in the range of 1 nm to 1000 nm. 
     
     
         3 . The chemical sensor element for detecting target substances in the specimen according to  claim 1 , wherein a target-capturing substance is disposed in the metal-containing particles. 
     
     
         4 . A method for fabricating a chemical sensor element wherein metal-containing particles are fixed on a substrate, comprising the steps of:
 preparing a dispersion comprised of metal-containing particles and dielectric particles as the dispersoids;   making the dispersion in contact with the substrate to fix the metal-containing particles and the dielectric particles on the substrate; and   isolating the metal-containing particles and the dielectric particles fixed on the substrate from the dispersion.   
     
     
         5 . The method for fabricating a chemical sensor element according to  claim 4 , wherein the diameter of the metal-containing particles is in the range of 1 nm to 1000 nm, and the diameter of the dielectric particles is in the range of 1 nm to 1000 nm. 
     
     
         6 . The method for fabricating a chemical sensor element according to  claim 4 , further comprising the step of removing the dielectric particles fixed on the substrate.