Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same

Abstract

A method of exposing a wafer to a light comprises transferring an image onto a plurality of shot areas by irradiating a projection light, each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed, and scanning the at least one die area adjacent to an edge portion of the wafer by irradiating a scanning light.

1 . A reticle for exposing a wafer to a light, comprising: 
 a first region including an image pattern irradiated by an illumination light, an image corresponding to the image pattern being transferred on a plurality of shot areas, and each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed; and    a second region for exposing die areas adjacent to edge portions of the wafer to the illumination light, the second region being disposed adjacent to the first region.    
   
   
       2 . The reticle of  claim 1 , wherein the second region includes a second image pattern for forming a light transmitting area having a ribbon shape.  
   
   
       3 . A reticle assembly for exposing a wafer to a light, comprising: 
 a reticle including a projection pattern for transferring an image onto a plurality of shot areas using an illumination light, each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed;    a light transmitting member disposed adjacent to the reticle, the light transmitting member including a light transmitting area for exposing the at least one die area adjacent to an edge portion of the wafer to an illumination light; and    a stage for supporting the reticle and the light transmitting member.    
   
   
       4 . The reticle assembly of  claim 3 , wherein the light transmitting area has a rectangular ribbon shape.  
   
   
       5 . The reticle assembly of  claim 4 , wherein the light transmitting member includes a substrate comprising a light transmitting material and a pattern for forming the light transmitting area on the substrate.  
   
   
       6 . The reticle assembly of  claim 3 , wherein the stage includes a main opening through which the illumination light passes after having passed through the reticle, and a subsidiary opening through which the illumination light passes after having passed through the light transmitting member.  
   
   
       7 . The reticle assembly of  claim 6 , further comprising first and second holders for respectively holding the reticle and the light transmitting member using a vacuum, the first and second holders being disposed at a peripheral portion of the main opening and subsidiary opening, respectively.  
   
   
       8 . The reticle assembly of  claim 6 , further comprising a reticle holder for holding the reticle using a vacuum, the reticle holder being disposed at a peripheral portion of the main opening.  
   
   
       9 . The reticle assembly of  claim 8 , wherein the light transmitting member is engaged with a peripheral portion of the subsidiary opening for covering the subsidiary opening.  
   
   
       10 . The reticle assembly of  claim 9 , wherein the light transmitting member has a rectangular plate shape, and includes a slot therein through which the illumination light passes.  
   
   
       11 . The reticle assembly of  claim 3 , wherein the reticle and the light transmitting member are in an integrally formed structure.  
   
   
       12 . The reticle assembly of  claim 11 , wherein the stage includes an opening portion through which the illumination light passes after having passed through the reticle and the light transmitting member.  
   
   
       13 . The reticle assembly of  claim 12 , further comprising a holder for holding the reticle and the light transmitting member using a vacuum, the holder being disposed at peripheral portion of the opening portion.  
   
   
       14 . An apparatus for exposing a wafer, comprising: 
 a light source for generating a light;    a reticle including a first region including an image pattern being irradiated by the light, an image corresponding to the image pattern being transferred on a plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed, and a second region for exposing die areas adjacent to edge portions of the wafer using the light, the second region being disposed adjacent to the first region;    a reticle stage for supporting the reticle;    an illumination unit for illuminating the reticle using the light;    a projection unit for projecting the light having passed through the reticle onto the wafer; and    a wafer stage for supporting the wafer.    
   
   
       15 . The apparatus of  claim 14 , wherein the second region includes a second image pattern for forming a light transmitting area having a ribbon shape.  
   
   
       16 . The apparatus of  claim 14 , wherein the reticle stage includes an opening portion through which the illumination light passes after having passed through the first region and the second region.  
   
   
       17 . The apparatus of  claim 16 , further comprising a holder for holding the reticle using a vacuum, the holder being disposed at a peripheral portion of the opening portion.  
   
   
       18 . An apparatus for exposing a wafer, comprising: 
 a light source for generating a light;    a reticle assembly including a reticle having a pattern for transferring an image onto a plurality of shot areas using the light, each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed, a light transmitting member including a light transmitting area for exposing die areas adjacent to an edge portion of the wafer using the light, the light transmitting member being disposed adjacent to the reticle, and a reticle stage for supporting the reticle and the light transmitting member;    an illumination unit for illuminating the reticle and the light transmitting member using the light;    a projection unit for projecting the light having passed through the reticle and the light transmitting member onto the wafer; and    a wafer stage for supporting the wafer.    
   
   
       19 . The apparatus of  claim 18 , wherein the light transmitting area has a rectangular ribbon shape.  
   
   
       20 . The apparatus of  claim 18 , wherein the light transmitting member includes a substrate comprising a light transmitting material and a pattern for forming the light transmitting area on the substrate.  
   
   
       21 . The apparatus of  claim 18 , further comprising a driving unit for moving the wafer vertically with respect to a light axis of the illumination light, so that the die areas are scanned by the light having passed through the light transmitting member while die areas adjacent to the edge portion of the wafer are exposed.  
   
   
       22 . The apparatus of  claim 18 , wherein the reticle stage includes a main opening through which the light passes after having passed through the reticle, and a subsidiary opening through which the light passes after having passed through the light transmitting member.  
   
   
       23 . The apparatus of  claim 22 , further comprising first holder and the second holder for respectively holding the reticle and the light transmitting member using a vacuum, the first and second holders being disposed at a peripheral portion of the main opening and subsidiary opening, respectively.  
   
   
       24 . The apparatus of  claim 22 , further comprising a reticle holder for holding the reticle using a vacuum, the reticle holder being disposed at a peripheral portion of the main opening.  
   
   
       25 . The apparatus of  claim 24 , wherein the light transmitting member is engaged with a peripheral portion of the subsidiary opening for covering the subsidiary opening.  
   
   
       26 . The apparatus of  claim 25 , wherein the light transmitting member has a rectangular plate shape, and includes a slot therein through which the light passes.  
   
   
       27 . The apparatus of  claim 18 , further comprising a first driving unit for driving the reticle in a horizontal direction, and a second driving unit for driving the wafer in an opposite direction to the reticle while the image is transferred onto the plurality of shot areas.