US2007246829A1PendingUtilityA1

Semiconductor device and method for producing the same

Assignee: MATSUSHITA ELECTRIC INDUSTRIAL CO LTDPriority: Apr 11, 2003Filed: Jun 21, 2007Published: Oct 25, 2007
Est. expiryApr 11, 2023(expired)· nominal 20-yr term from priority
H10W 72/07336H10W 72/07331H10W 72/352H10W 72/073H01S 5/0237H01S 5/02476H01S 5/0014H01S 5/32341H01S 5/0234H01S 5/02345
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Claims

Abstract

A method for producing a semiconductor device of the present invention includes forming a surface electrode on a semiconductor element, forming a solder layer by plating on one principal surface of the surface electrode, mounting the semiconductor element on the sub-mount so that the solder layer contacts a principal surface of the sub-mount, and bonding the sub-mount and the semiconductor element to each other via the solder layer.

Claims

exact text as granted — not AI-modified
1 - 24 . (canceled)  
     
     
         25 . A semiconductor device having a sub-mount and a semiconductor element bonded to each other via a solder layer, comprising: 
 a surface electrode formed on a principal surface of the semiconductor element on the sub-mount side;    the solder layer partially formed on the surface electrode; and    a covering layer formed over an entire surface of the solder layer,    wherein a part of the surface electrode is exposed, and    wherein the covering layer is made of an Au-rich layer.    
     
     
         26 . The semiconductor device according to  claim 25 , wherein the Au-rich layer contains Au in an amount of 90 wt % or more.  
     
     
         27 - 31 . (canceled)

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