US2007246829A1PendingUtilityA1
Semiconductor device and method for producing the same
Assignee: MATSUSHITA ELECTRIC INDUSTRIAL CO LTDPriority: Apr 11, 2003Filed: Jun 21, 2007Published: Oct 25, 2007
Est. expiryApr 11, 2023(expired)· nominal 20-yr term from priority
H10W 72/07336H10W 72/07331H10W 72/352H10W 72/073H01S 5/0237H01S 5/02476H01S 5/0014H01S 5/32341H01S 5/0234H01S 5/02345
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Claims
Abstract
A method for producing a semiconductor device of the present invention includes forming a surface electrode on a semiconductor element, forming a solder layer by plating on one principal surface of the surface electrode, mounting the semiconductor element on the sub-mount so that the solder layer contacts a principal surface of the sub-mount, and bonding the sub-mount and the semiconductor element to each other via the solder layer.
Claims
exact text as granted — not AI-modified1 - 24 . (canceled)
25 . A semiconductor device having a sub-mount and a semiconductor element bonded to each other via a solder layer, comprising:
a surface electrode formed on a principal surface of the semiconductor element on the sub-mount side; the solder layer partially formed on the surface electrode; and a covering layer formed over an entire surface of the solder layer, wherein a part of the surface electrode is exposed, and wherein the covering layer is made of an Au-rich layer.
26 . The semiconductor device according to claim 25 , wherein the Au-rich layer contains Au in an amount of 90 wt % or more.
27 - 31 . (canceled)Join the waitlist — get patent alerts
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