Enhanced Multi Channel Alignment

Abstract

A imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.

1 . An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system comprising:
 a first set of imaging units positioned at a first angle relative to normal of the substrate; and   a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.   
     
     
         2 . The system as recited in  claim 1 , wherein the imaging units are operable to view alignment marks on the substrate in order to properly align the system with an imprinting field on the substrate. 
     
     
         3 . The system as recited in  claim 2 , wherein the first and second angles are defined by angles in degrees between the normal angle to the substrate and longitudinal axes of the imaging units. 
     
     
         4 . The system as recited in  claim 3 , wherein each imaging unit comprises an imaging system that emits a light beam in parallel alignment with the imaging unit's longitudinal axis towards its respective alignment mark. 
     
     
         5 . The system as recited in  claim 1 , wherein the first and second sets of imaging units each comprise four imaging units. 
     
     
         6 . The system as recited in  claim 5 , wherein the eight imaging units comprise an N-channel imaging system, wherein N≧8, further comprising:
 first and second N-channel imaging systems positioned at an angle to each other; and a beam splitter operable for directing imaging light beams from both N-channel imaging systems towards alignment marks on the substrate.   
     
     
         7 . The system as recited in  claim 2 , further comprising x-y actuators for re-aligning certain ones of the imaging units in order to align the system for imprinting of a portion of the imprinting field. 
     
     
         8 . The system as recited in  claim 7 , wherein the portion of the imprinting field lies along an edge of the substrate. 
     
     
         9 . The system as recited in  claim 4 , wherein certain ones of the imaging units further comprise a prism to re-direct the light beam. 
     
     
         10 . The system as recited in  claim 4 , wherein certain ones of the imaging units further comprise a mirror to re-direct the light beam.