US2007222039A1PendingUtilityA1

Semiconductor device and manufacturing method of a semiconductor device

Assignee: FUJITSU LTDPriority: Mar 27, 2006Filed: Sep 25, 2006Published: Sep 27, 2007
Est. expiryMar 27, 2026(expired)· nominal 20-yr term from priority
H05K 3/467H05K 2201/10378H05K 3/323H05K 3/462H05K 3/4614H05K 2201/10674H10W 70/685H10W 72/877H10W 72/90H10W 72/9415H10W 90/00H10W 72/07331H10W 72/073H10W 72/07236H10W 72/07232H10W 72/072H10W 72/01212H10W 72/325H10W 72/354H10W 72/352H10W 90/724H10W 90/734H10P 72/7424H10P 72/74H10W 40/10
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Claims

Abstract

A semiconductor device includes a multi-layer substrate and a semiconductor element mounted on the multi-layer substrate. The multi-layer substrate contains a plurality of circuit-formation layers joined by a first resin material. The semiconductor element is mounted on the multi-layer substrate by being joined to the multi-layer substrate by a second resin material. The first resin material and the second resin material are curable in the same heating condition.

Claims

exact text as granted — not AI-modified
1 . A semiconductor device comprising:
 a multi-layer substrate containing a plurality of circuit-formation layers joined by a first resin material; and   a semiconductor element mounted on the multi-layer substrate by being joined to said multi-layer substrate by a second resin material,   wherein the first resin material and the second resin material are curable in the same heating condition.   
     
     
         2 . The semiconductor device as claimed in  claim 1 , wherein said first resin material and said second resin material are made of the same resin. 
     
     
         3 . The semiconductor device as claimed in  claim 1 , further comprising a heat radiation member joined to the semiconductor element by a third resin material, wherein the third resin material is made of a resin curable in the same heating condition as said first and second resin materials. 
     
     
         4 . The semiconductor device as claimed in  claim 3 , wherein said third resin material is made of the same resin as said first and second resin materials. 
     
     
         5 . The semiconductor device as claimed in  claim 1 , wherein each of said first resin material and said second resin material is formed of an insulating resin and an electrically conductive resin embedded in the insulating resin, and electrodes of said semiconductor element are joined to electrodes of said multi-layer substrate by the electrically conductive resin. 
     
     
         6 . The semiconductor device as claimed in  claim 5 , further comprising a heat radiation member joined to the semiconductor element by a third resin material, wherein the third resin material is made of the same resin as said electrically conductive resin of said first and second resin materials. 
     
     
         7 . The semiconductor device as claimed in  claim 5 , wherein said electrically conductive resin contains electrically conductive particles dispersed in a base resin material and solder diffused in the base material. 
     
     
         8 . A manufacturing method of a semiconductor device having a semiconductor element mounted on a multi-layer substrate, comprising:
 preparing the multi-layer substrate by arranging a first resin material of a sheet shape between a plurality of circuit-formation layers and forming a laminated member by arranging the semiconductor element on the multi-layer substrate via a second resin material of a sheet shape; and   curing the first and second resin materials by heating while pressurizing the laminated member so as to simultaneously join said circuit-formation layers to each other and said semiconductor element.   
     
     
         9 . The manufacturing method as claimed in  claim 8 , including:
 arranging a heat radiation member on said semiconductor element of said laminated member via a third resin material; and   curing the third resin material simultaneously when heating said laminated member so as to join said heat radiation member to said semiconductor element.   
     
     
         10 . The manufacturing method as claimed in  claim 8 , including:
 forming said first resin material by filling an electrically conductive resin in openings formed in an insulating resin of a sheet shape at positions corresponding to electrodes of said circuit-formation layer; and   forming said second resin material by filling an electrically conductive resin in openings formed in an insulating resin of a sheet shape at positions corresponding to electrodes of said semiconductor element.   
     
     
         11 . A manufacturing method as claimed in  claim 10 , wherein said electrically conductive resin is formed of a base resin and electrically conductive particles dispersed in the base resin, and a metal film is formed on a surface of each of the electrically conductive particles. 
     
     
         12 . The manufacturing method as claimed in  claim 11 , wherein said electrically conductive particles are metal particles, and said metal film is a solder film.

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