US2007204795A1PendingUtilityA1

System and methods for manufacturing a liquid crystal device

Assignee: SEIKO EPSON CORPPriority: Feb 22, 2002Filed: May 2, 2007Published: Sep 6, 2007
Est. expiryFeb 22, 2022(expired)· nominal 20-yr term from priority
H10P 72/0448B05C 11/08C09K 2323/027C09K 2323/00
52
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Claims

Abstract

The invention provides a thin-film forming device, a thin-film forming method, a device for manufacturing a liquid crystal display, a method for manufacturing a liquid crystal display, a device for manufacturing a thin-film structure, a method for a thin-film structure, a liquid crystal display, a thin-film structure, and an electronic apparatus, objects are to achieve easy control of thickness of a thin film without using rotation means, cost reduction, and miniaturization of the devices. The thin-film forming device for forming a thin film by applying a coating solution onto a substrate, there can be provided an ejection mechanism having a droplet ejection head for ejecting the coating solution onto the substrate, a moving mechanism capable of relatively moving the positions of the droplet ejection head and the substrate, and a control unit for controlling at least one of the ejection mechanism and the moving mechanism. As a result, the control unit described above can control the thickness of the thin film by changing the coating conditions of the coating solution L by controlling at least one of an ejection operation by the ejection mechanism and a moving operation by the moving mechanism.

Claims

exact text as granted — not AI-modified
1 . A thin-film forming device for forming a thin film by applying a coating solution onto a substrate, comprising: 
 an ejection mechanism having a droplet ejection head that ejects the coating solution onto the substrate;    a moving mechanism capable of relatively moving positions of the droplet ejection head and the substrate; and    a control unit that controls at least one of the ejection mechanism and the moving mechanism,    the control unit changing coating conditions of the coating solution by controlling at least one of an ejection operation by the ejection mechanism and a moving operation by the moving mechanism so as to control a thickness of the thin film.    
   
   
       2 . The thin-film forming device according to  claim 1 , the control unit changing ejection spatial intervals for ejecting the coating solution onto the substrate.  
   
   
       3 . The thin-film forming device according to  claim 2 , the control unit changing the ejection spatial intervals by changing a speed of the moving operation.  
   
   
       4 . The thin-film forming device according to  claim 2 , the control unit changing the ejection spatial intervals by changing time intervals for the ejection during the moving operation.  
   
   
       5 . The thin-film forming device according to  claim 2 , the droplet ejection head being provided with a plurality of nozzles aligned in at least one line, and the control unit optionally assigning some nozzles among said plurality of nozzles to simultaneously eject the coating solution for changing the ejection spatial intervals.  
   
   
       6 . The thin-film forming device according to  claim 1 , the control unit changing an ejection amount of the coating solution per dot.  
   
   
       7 . The thin-film forming device according to  claim 1 , the droplet ejection head being provided with a plurality of nozzles aligned in at least one line, and the control unit changing an ejection amount ejected from each of said plurality of nozzles.  
   
   
       8 . The thin-film forming device according to  claim 1 , the droplet ejection head being provided with a plurality of nozzles aligned in at least one line, and 
 the control unit changing an angle formed by an alignment direction of the nozzles and a moving direction by the moving mechanism.    
   
   
       9 . The thin-film forming device according to  claim 1 , the control unit setting the coating conditions for each of coating steps which are repeatedly performed on the substrate.  
   
   
       10 . The thin-film forming device according to  claim 1 , the control unit setting coating conditions for each of a plurality of regions on the substrate.  
   
   
       11 . The thin-film forming device according to  claim 1 , the coating solution being a photoresist solution.  
   
   
       12 . The device for manufacturing a liquid crystal display comprising a pair of substrates, liquid crystal provided therebetween, and an alignment film and an insulating film provided on at least one of the substrates, the device comprising: 
 a thin-film forming device according to  claim 1 , the thin-film forming device forming at least one of an alignment film and an insulating film.    
   
   
       13 . A device for manufacturing a thin-film structure having a substrate and a thin film provided thereon, comprising a thin-film forming device according to  claim 1 , the thin-film forming device forming the thin film.

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