Polishing pad having a surface texture and method and apparatus for fabricating the same

Abstract

The present invention relates to a polishing pad having a surface texture and a method for fabricating the same. The fabricating method comprises the following steps: (a) providing a substrate which has a surface for polishing an object to be polished; (b) providing a freely movable high-energy laser; and (c) forming a surface texture on the surface of the substrate by using the high-energy laser. Thereby, burrs and deformation of fabricated polishing pad may not occur, and when the polishing pad is used, the slurry can maintain good flowage without scraping the object to be polished. Moreover, the desired surface texture can be fabricated rapidly and correctly by using a high-energy laser with extremely high reproducibility.

1 . A method for fabricating a polishing pad having a surface texture, comprising the following steps: 
 (a) providing a substrate having a surface for polishing an object to be polished;    (b) providing a freely movable high-energy laser; and    (c) forming a surface texture on the surface of the substrate by using the freely moveable high-energy laser.    
     
     
         2 . The fabricating method as claimed in  claim 1 , wherein the substrate is a polishing pad without a surface texture, and the material thereof is selected from a group consisting of a free PU plat, a PU and fiber synthetic material, and a PU and micro-fiber synthetic material.  
     
     
         3 . The fabricating method as claimed in  claim 1 , wherein two ends of the high-energy laser of the step (b) are a starting end and a processing end respectively, the starting end is emitted by a high-energy laser generating apparatus in a fixed position, the processing end is used to touch and process the substrate and performs a circular movement, and the high-energy laser has a straight line appearance.  
     
     
         4 . The fabricating method as claimed in  claim 1 , wherein two ends of the high-energy laser of the step (b) are a starting end and a processing end respectively, the starting end is emitted by a high-energy laser generating apparatus in a movable position, the processing end is used to touch and process the substrate, and the high-energy laser has a straight line appearance and is kept vertical to the surface of the substrate when moving.  
     
     
         5 . The fabricating method as claimed in  claim 1 , wherein two ends of the high-energy laser of the step (b) are a starting end and a processing end respectively, the starting end is emitted from a high-energy laser generating apparatus in a fixed position, the processing end is used to touch and process the substrate, and the high-energy laser includes a plurality of sections having different directions respectively.  
     
     
         6 . The fabricating method as claimed in  claim 1 , wherein the step (c) comprises: 
 (c1) providing a processing pattern; and    (c2) forming a surface texture on the surface of the polishing pad by using the high-energy laser according to the processing pattern.    
     
     
         7 . The fabricating method as claimed in  claim 1 , wherein the surface texture comprises a plurality of straight grooves interlaced with each other, and the straight grooves have a plurality of crossing points.  
     
     
         8 . The fabricating method as claimed in  claim 7 , wherein the surface texture further comprises a plurality of holes which are located on the crossing points.  
     
     
         9 . The fabricating method as claimed in  claim 1 , wherein the surface texture comprises a plurality of circular grooves with different radii, the circular grooves are concentric, there is an inclined angle between the walls of the circular grooves and the vertical direction of the surface of the substrate, and the inclined angles of the circular grooves increase from the inside circular groove to the outside circular groove.  
     
     
         10 . An apparatus for fabricating a polishing pad having a surface texture, comprising: 
 a platform, for carrying a substrate having a surface for polishing an object to be polished;    a high-energy laser generating apparatus, for generating a high-energy laser; and    a reflecting apparatus, for reflecting the high-energy laser to the surface of the substrate, so as to form a surface texture on the surface of the substrate.    
     
     
         11 . The fabricating apparatus as claimed in  claim 10 , further comprising a data processing apparatus for generating a processing pattern, so as to control the high-energy laser generating apparatus and the reflecting apparatus.  
     
     
         12 . The fabricating apparatus as claimed in  claim 10 , wherein the position of the platform is fixed.  
     
     
         13 . The fabricating apparatus as claimed in  claim 10 , wherein the position of the high-energy laser generating apparatus is fixed.  
     
     
         14 . The fabricating apparatus as claimed in  claim 10 , wherein two ends of the high-energy laser are a starting end and a processing end respectively, the starting end is emitted by the high-energy laser generating apparatus, the processing end is used to touch and process the substrate, and the high-energy laser includes a plurality of sections having different directions.  
     
     
         15 . The fabricating apparatus as claimed in  claim 10 , wherein the reflecting apparatus is a mirror.  
     
     
         16 . The fabricating apparatus as claimed in  claim 10 , wherein the reflecting apparatus comprises a plurality of mirrors.  
     
     
         17 . A polishing pad having a surface texture, comprising: 
 a substrate, having a surface for polishing an object to be polished; and    a surface texture, located on the surface of the substrate, and the surface texture having a plurality of grooves and a plurality of holes, wherein the grooves are interlaced to form a plurality of crossing points and the holes are located on the crossing points.    
     
     
         18 . The polishing pad as claimed in  claim 17 , wherein the grooves are straight grooves, and are interlaced with each other to form the crossing points.  
     
     
         19 . The polishing pad as claimed in  claim 17 , wherein the grooves comprise a plurality of straight grooves and a plurality of circular grooves with different radii, and the straight grooves are radial and interlaced with the circular grooves, thus forming the crossing points.  
     
     
         20 . A polishing pad having a surface texture, comprising: 
 a substrate, having a surface for polishing an object to be polished; and    a surface texture, located on the surface of the substrate, and the surface texture having a plurality of circular grooves with different radii and a plurality of holes, wherein the circular grooves are concentric, the holes are located on the circular grooves, and the distribution density of the holes increases from the inside circular groove to the outside circular groove.    
     
     
         21 . A polishing pad having a surface texture, comprising: 
 a substrate, having a surface for polishing an object to be polished; and    a surface texture, located on the surface of the substrate, and the surface texture having a plurality of circular grooves with different radii, wherein the circular grooves are concentric, there is an inclined angle between the walls of the circular grooves and the vertical direction of the surface of the polishing pad, and the inclined angles of the circular grooves increase from the inside circular groove to the outside circular groove.    
     
     
         22 . The polishing pad as claimed in  claim 21 , wherein the surface texture further comprises a plurality of holes.  
     
     
         23 . The polishing pad as claimed in  claim 21 , wherein the inclined angle of the innermost circular groove is 0 degree.