Method of manufacturing mirror support post of micromirror device using electro-plating process

Abstract

An embodiment of the present invention relates to a digital micromirror device. More particularly, an embodiment of the present invention relates to a method of manufacturing a digital micromirror device having a perfectly flat mirror surface, wherein a hole of a mirror surface from which light is reflected is obviated by forming a mirror support post portion using an electro-plating process, unlike the related art digital micromirror device in which the hole is formed at the center of the mirror surface, thereby degrading the reflection efficiency of light.

1 . A method of manufacturing a mirror support post of a micromirror device using a plating process, the method comprising the steps of: 
 forming a seed electrode on a substrate;    forming a lower electrode, a driving unit of a micromirror, and a sacrificial layer comprising a mirror support post formation region on the seed electrode; and    forming a mirror support post in the mirror support post formation region using an electro-plating process.    
   
   
       2 . The method as claimed in  claim 1 , wherein in the step of forming the mirror support post, the mirror support post has the same height as the sacrificial layer.  
   
   
       3 . The method as claimed in  claim 1 , wherein in the step of forming the mirror support post, the mirror support post has a flat surface.  
   
   
       4 . A method of manufacturing a mirror support post of a micromirror device using a plating process, the method comprising the steps of: 
 forming a lower electrode, a sacrificial layer and a cantilever support post of a driving unit of a micromirror on a substrate;    forming a seed electrode on the cantilever support post of the driving unit of the micromirror;    forming a cantilever of the micromirror and a sacrificial layer comprising a mirror support post formation region on the seed electrode; and    forming the mirror support post in the mirror support post formation region using an electro-plating process.    
   
   
       5 . The method as claimed in  claim 4 , wherein in the step of forming the mirror support post, the mirror support post has the same height as the sacrificial layer.  
   
   
       6 . The method as claimed in  claim 4 , wherein in the step of forming the mirror support post, the mirror support post has a flat surface.  
   
   
       7 . A method of manufacturing a mirror support post of a micromirror device using a plating process, the method comprising the steps of: 
 forming a conducting layer on a substrate;    forming a lower sacrificial layer, a hinge and a yoke on the conducting layer;    forming an upper sacrificial layer comprising a mirror support post formation region on the yoke and the hinge; and    forming a mirror support post in the mirror support post formation region by an electro-plating process.    
   
   
       8 . The method as claimed in  claim 7 , wherein in the step of forming the mirror support post, the mirror support post has the same height as the upper sacrificial layer.  
   
   
       9 . The method as claimed in  claim 7 , wherein in the step of forming the mirror support post, the mirror support post has a flat surface.