Gas supply system, substrate processing apparatus and gas supply method

Abstract

A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second processing gas branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; a first and a second additional gas branch line; a flow path switching unit; and a control unit. Before processing the substrate to be processed, the control unit performs a pressure ratio control on the branch flow control unit while the processing gas supply unit supplies the processing gas. After the inner pressures of the first and the second processing gas branch line become stable, the control unit switches the pressure ratio control to a fixed pressure control, and then the additional gas supply unit supplies the additional gas.

1 . A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, the system comprising:
 a processing gas supply unit for supplying processing gas for processing the substrate to be processed;   a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;   a first and a second processing gas branch line branched from the processing gas supply line to be connected with different portions of the processing chamber;   a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second processing gas branch line based on inner pressures of the first and the second processing gas branch line, respectively;   an additional gas supply unit for supplying additional gas;   an additional gas supply line for allowing the additional gas from the additional gas supply unit to flow therein;   a first additional gas branch line branched from the additional gas supply line to be connected with the first processing gas branch line at a downstream side of the branch flow control unit;   a second additional gas branch line branched from the additional gas supply line to be connected with the second processing gas branch line at a downstream side of the branch flow control unit;   a flow path switching unit for switching a flow path of the additional gas from the additional gas supply line between the first and the second additional gas branch line; and   a control unit for supplying, before processing the substrate to be processed, the processing gas from the processing gas supply unit while performing a pressure ratio control on the branch flow control unit such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at a target pressure ratio, and then supplying the additional gas from the additional gas supply unit after the inner pressures of the first and the second processing gas branch line become stable to be at a first and a second stable inner pressure, wherein in case of supplying the additional gas to the second processing gas branch line via the second additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a first fixed pressure control that controls the branch flows such that the first stable inner pressure is maintained in the first processing gas branch line, whereas in case of supplying the additional gas to the first processing gas branch line via the first additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a second fixed pressure control that controls the branch flows such that the second stable inner pressure is maintained in the second processing gas branch line.   
   
   
       2 . The gas supply system of  claim 1 , wherein, when the inner pressures of the first and the second processing gas branch line become stable to be at a third and a fourth stable inner pressure after supplying the additional gas, the control unit sets a pressure ratio between the third and the fourth stable inner pressure as a new target pressure ratio; and switches the fixed pressure control on the branch flow control unit to another pressure ratio control that controls the branch flows such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at the new target pressure ratio. 
   
   
       3 . The gas supply system of  claim 1 , wherein the branch flow control unit has valves for controlling flow rates of the processing gas flowing through the first and the second processing gas branch line; and pressure sensors that detect the inner pressures of the first and the second processing gas branch line, respectively, wherein a ratio of the flow rates of the processing gas flowing through the first and the second processing gas branch line is controlled by controlling the valves based on the inner pressures detected by the pressure sensors. 
   
   
       4 . The gas supply system of  claim 1 , wherein the processing gas supply unit has a plurality of gas supply sources to supply to the processing gas supply line the processing gas obtained by mixing gases from the gas supply sources at a specific flow rate ratio. 
   
   
       5 . The gas supply system of  claim 1 , wherein the additional gas supply unit has a number of gas supply sources to supply to the additional gas supply line, the additional gas obtained by selecting a gas from the gas supply sources or by mixing gases therefrom at a specific gas flow rate ratio. 
   
   
       6 . The gas supply system of  claim 1 , wherein the first processing gas branch line is arranged to supply the processing gas flowing therein toward a central region on a surface of the substrate disposed in the processing chamber; and the second processing gas branch line is arranged to supply the processing gas flowing therein toward a peripheral region on the surface of the substrate. 
   
   
       7 . The gas supply system of  claim 1 , wherein the second processing gas branch line is configured as plural branch lines branched from the processing gas supply line, and the additional gas from the additional gas supply unit is supplied to each of the plural branch lines. 
   
   
       8 . A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, the system comprising:
 a processing gas supply unit for supplying processing gas for processing the substrate to be processed;   a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;   a first and a second processing gas branch line branched from the processing gas supply line to be connected with different portions of the processing chamber;   a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second processing gas branch line based on inner pressures of the first and the second processing gas branch line, respectively;   an additional gas supply unit for supplying additional gas;   an additional gas supply line for allowing the additional gas from the additional gas supply unit to flow therein;   a first additional gas branch line branched from the additional gas supply line to be connected with the first processing gas branch line at a downstream side of the branch flow control unit;   a second additional gas branch line branched from the additional gas supply line to be connected with the second processing gas branch line at a downstream side of the branch flow control unit; and   an opening/closing valve, provided on each of either one or both of the first and the second additional gas branch line, for opening and closing each of said either one or both of the additional gas branch lines.   
   
   
       9 . A substrate processing apparatus comprising:
 a processing chamber for processing a substrate to be processed;   a gas supply system for supplying a gas into the processing chamber; and   a control unit for controlling the gas supply system,   wherein the gas supply system includes:
 a processing gas supply unit for supplying processing gas for processing the substrate to be processed; 
 a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein; 
 a first and a second processing gas branch line branched from the processing gas supply line to be connected with different portions of the processing chamber; 
 a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second processing gas branch line based on inner pressures of the first and the second processing gas branch line, respectively; 
 an additional gas supply unit for supplying additional gas; 
 an additional gas supply line for allowing the additional gas from the additional gas supply unit to flow therein; 
 a first additional gas branch line branched from the additional gas supply line to be connected with the first processing gas branch line at a downstream side of the branch flow control unit; 
 a second additional gas branch line branched from the additional gas supply line to be connected with the second processing gas branch line at a downstream side of the branch flow control unit; and 
 a flow path switching unit for switching a flow path of the additional gas from the additional gas supply line between the first and the second additional gas branch line, and 
   wherein the control unit supplies, before processing the substrate to be processed, the processing gas from the processing gas supply unit while performing a pressure ratio control on the branch flow control unit such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at a target pressure ratio, and then supplies the additional gas from the additional gas supply unit after the inner pressures of the first and the second processing gas branch line become stable to be at a first and a second stable inner pressure, wherein in case of supplying the additional gas to the second processing gas branch line via the second additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a first fixed pressure control that controls the branch flows such that the first stable inner pressure is maintained in the first processing gas branch line, whereas in case of supplying the additional gas to the first processing gas branch line via the first additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a second fixed pressure control that controls the branch flows such that the second stable inner pressure is maintained in the second processing gas branch line.   
   
   
       10 . The substrate processing apparatus of  claim 9 , wherein, when the inner pressures of the first and the second processing gas branch line become stable to be at a third and a fourth stable inner pressure after supplying the additional gas, the control unit sets a pressure ratio between the third and the fourth stable inner pressure as a new target pressure ratio; switches the fixed pressure control on the branch flow control unit to another pressure ratio control that controls the branch flows such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at the new target pressure ratio; and then starts a processing of the substrate to be processed. 
   
   
       11 . A gas supply method for use with a gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, wherein the gas supply system includes a processing gas supply unit for supplying processing gas for processing the substrate to be processed; a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein; a first and a second processing gas branch line branched from the processing gas supply line to be connected with different portions of the processing chamber; a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second processing gas branch line based on inner pressures of the first and the second processing gas branch line, respectively; an additional gas supply unit for supplying additional gas; an additional gas supply line for allowing the additional gas from the additional gas supply unit to flow therein; a first additional gas branch line branched from the additional gas supply line to be connected with the first processing gas branch line at a downstream side of the branch flow control unit; a second additional gas branch line branched from the additional gas supply line to be connected with the second processing gas branch line at a downstream side of the branch flow control unit; and a flow path switching unit for switching a flow path of the additional gas from the additional gas supply line between the first and the second additional gas branch line, the method comprising the steps of:
 supplying, before processing the substrate to be processed, the processing gas from the processing gas supply unit while performing a pressure ratio control on the branch flow control unit such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at a target pressure ratio; and   supplying the additional gas from the additional gas supply unit after the inner pressures of the first and the second processing gas branch line become stable to be at a first and a second stable inner pressure, wherein in case of supplying the additional gas to the second processing gas branch line via the second additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a first fixed pressure control that controls the branch flows such that the first stable inner pressure is maintained in the first processing gas branch line, whereas in case of supplying the additional gas to the first processing gas branch line via the first additional gas branch line, the additional gas is supplied from the additional gas supply unit after the control unit switches the pressure ratio control on the branch flow control unit to a second fixed pressure control that controls the branch flows such that the second stable inner pressure is maintained in the second processing gas branch line.   
   
   
       12 . The gas supply method of  claim 11 , further comprising the steps of:
 setting, when the inner pressures of the first and the second processing gas branch line become stable to be at a third and a fourth stable inner pressure after supplying the additional gas, a pressure ratio between the third and the fourth stable inner pressure as a new target pressure ratio; and   switching the fixed pressure control on the branch flow control unit to another pressure ratio control that controls the branch flows such that a pressure ratio between the inner pressures of the first and the second processing gas branch line is kept at the new target pressure ratio.