Microscope and sample observation method
Abstract
For a semiconductor device S as a sample of an observed object, there are provided an image acquisition part 1 for carrying out observation of the semiconductor device S, and an optical system 2 comprising an objective lens 20. A solid immersion lens (SIL) 3 for magnifying an image of the semiconductor device S is arranged movable between an insertion position where the solid immersion lens includes an optical axis from the semiconductor device S to the objective lens 20 and is in close contact with a surface of the semiconductor device S, and a standby position off the optical axis. Then an image containing reflected light from SIL 3 is acquired with the SIL 3 at the insertion position, and the insertion position of SIL 3 is adjusted by SIL driver 30, with reference to the image. This realizes a semiconductor inspection apparatus (microscope) capable of readily performing observation of the sample necessary for an analysis of microstructure of a semiconductor device or the like, and a semiconductor inspection method (sample observation method) therewith.
Claims
exact text as granted — not AI-modified1 - 6 . (canceled)
7 . A sample observation method of observing a sample, comprising:
a configuring step of configuring a solid immersion lens so that it reflects light in a direction towards an optical system; a position adjustment step of acquiring an image containing light that has been reflected by the solid immersion lens through the optical system to which light from a sample is incident, and adjusting a position of the solid immersion lens relative to the optical system, with reference to the image; and an image acquisition step of acquiring an observation image of the sample enlarged by the solid immersion lens, through the solid immersion lens and the optical system.
8 . The sample observation method according to claim 7 , wherein the position adjustment step is to adjust the position of the solid immersion lens so that a position of a center of gravity of a reflected light image is positioned on an optical axis of the optical system, with reference to the image containing the reflected light from the solid immersion lens.
9 . The sample observation method according to claim 7 , comprising a distance adjustment step of adjusting a distance between the optical system and the sample.
10 . The sample observation method according to claim 7 , wherein the position adjustment step is to acquire the image containing only light that has been reflected by the solid immersion lens, and not containing light that has been reflected by the sample.
11 . The sample observation method according to claim 7 , wherein, in the position adjustment step, the position of the solid immersion lens is adjusted in a plane perpendicular to an optical axis of the optical system.
12 . A sample observation method of observing a sample, comprising:
a configuring step of configuring a solid immersion lens so that it reflects light in a direction towards an optical system; a position adjustment step of acquiring an image containing light that has been reflected by the top surface of the solid immersion lens through the optical system to which light from a sample is incident, and adjusting a position of the solid immersion lens relative to the optical system, with reference to the image; and an image acquisition step of acquiring an observation image of the sample enlarged by the solid immersion lens, through the solid immersion lens and the optical system.
13 . The sample observation method according to claim 12 , wherein the position adjustment step is to adjust the position of the solid immersion lens so that a position of a center of gravity of a reflected light image is positioned on an optical axis of the optical system, with reference to the image containing the reflected light from the top surface of the solid immersion lens.
14 . The sample observation method according to claim 12 , comprising a distance adjustment step of adjusting a distance between the optical system and the sample.
15 . The sample observation method according to claim 12 , wherein, in the position adjustment step, the position of the solid immersion lens is adjusted in a plane perpendicular to an optical axis of the optical system.
16 . A semiconductor observation method of observing a semiconductor device, comprising:
a configuring step of configuring a solid immersion lens so that it reflects light in a direction towards an optical system; a position adjustment step of acquiring an image containing light that has been reflected by the solid immersion lens through the optical system to which light from a semiconductor device is incident, and adjusting a position of the solid immersion lens relative to the optical system, with reference to the image; and an image acquisition step of acquiring an observation image of the semiconductor device enlarged by the solid immersion lens, through the solid immersion lens and the optical system.
17 . The semiconductor observation method according to claim 16 , wherein the position adjustment step is to adjust the position of the solid immersion lens so that a position of a center of gravity of a reflected light image is positioned on an optical axis of the optical system, with reference to the image containing the reflected light from the solid immersion lens.
18 . The semiconductor observation method according to claim 16 , comprising a distance adjustment step of adjusting a distance between the optical system and the semiconductor device.
19 . The semiconductor observation method according to claim 16 , wherein the position adjustment step is to acquire the image containing only light that has been reflected by the solid immersion lens, and not containing light that has been reflected by the semiconductor device.
20 . The semiconductor observation method according to claim 16 , wherein, in the position adjustment step, the position of the solid immersion lens is adjusted in a plane perpendicular to an optical axis of the optical system.Join the waitlist — get patent alerts
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