Implant capable of forming a differential image in an eye and methods of inserting and locating same

Abstract

An implant capable of forming a differential image in an eye is shown. The implant comprises an elongated member having a pair of spaced ends wherein one of the pair of ends includes a distal section that extends in a direction substantially parallel to the central axis. The elongated member and the distal section are formed of a dimension to be inserted into and/or passed through a punctum opening of an eye and into the canaliculus. The implant incorporates into at least one of the elongated member and the distal section an energy obstructing material responsive to the application of an energy wave, such as an energy wave in the form of sound waves vibrating at frequencies greater than 20,000 cycles per second or electromagnetic radiation, which upon everting of an eyelid of an eye and exposing the implant to an appropriate energy wave, forms a differential image pattern showing the location of the implant in the eye. Methods for treating an external eye condition due to a deficiency of tears and for locating an implant in the canaliculus of an eye using the implant capable of forming a differential image is also shown.

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       47 . A method for treating an external eye condition due to a deficiency of tears including the steps of 
 testing the eye to determine if a tear deficiency exists; and    if a tear deficiency is determined to exist, inserting into the punctum opening an implant capable of forming a differential image in an eye comprising an elongated member having a pair of spaced ends wherein one of said pair of ends includes a distal section which extends in a direction substantially parallel to the central axis, said elongated member and said distal section being formed of a dimension to be inserted into and passed through a punctum opening of an eye and an energy obstructing material responsive to the application of an energy wave being incorporated into at least one of said elongated member and said distal section which upon everting of an eyelid of an eye and exposing the implant to an energy wave forms a differential image pattern showing the location of said implant in the eye.    
   
   
       48 . A method for locating an implant in the canaliculus of an eye comprising the step of: 
 incorporating in an implant an energy obstructing material responsive to the application of an energy wave capable of forming a differential image in an eye wherein the implant comprising an elongated member having a pair of spaced ends wherein one of said pair of ends includes a distal section which extends in a direction substantially parallel to the central axis, said elongated member and said distal section being formed of a dimension to be inserted into and passed through a punctum opening of an eye;    everting an eyelid of an eye; and    exposing the implant to an energy wave to form a differential image pattern showing the location of said implant in the eye.    
   
   
       49 . The method of  claim 48  wherein the step of incorporating includes incorporating the energy obstructing material into at least one of said elongated member and said distal section.  
   
   
       50 . The method of  claim 48  wherein the step of incorporating includes incorporating an energy obstructing material which is responsive to the application of an energy wave being in the form of sound waves vibrating at frequencies greater than 20,000 cycles per second which upon everting of an eyelid of an eye and exposing the implant to an energy wave in the form of sound waves vibrating at frequencies greater than 20,000 cycles per second forms a differential image pattern showing the location of said implant in the eye.  
   
   
       51 . The method of  claim 48  wherein the step of incorporating includes incorporating an energy obstructing material which is responsive to the application of an energy wave being in the form of electromagnetic radiation at a selected frequency which upon everting of an eyelid of an eye and exposing the implant to an energy wave in the form of electromagnetic radiation at a selected frequency forms a differential image pattern showing the location of said implant in the eye.  
   
   
       52 . The method of  claim 48  wherein the step of incorporating includes incorporating said energy obstructing material to be integral with at least one of said elongated member and said distal section.  
   
   
       53 . The method of  claim 48  wherein the step of incorporating includes incorporating said energy obstructing material as a coating on at least one of said elongated member and said distal section.  
   
   
       54 . The method of  claim 48  wherein the step of incorporating includes incorporating said energy obstructing material to be integral with the implant.  
   
   
       55 . The method of  claim 48  wherein the step of incorporating includes incorporating said energy obstructing material as a coating on the implant.  
   
   
       56 . A method for locating an implant in an eye comprising the step of: 
 incorporating in an implant an radiation obstructing material responsive to the application of an electromagnetic radiation capable of forming a differential image in an eye wherein the implant comprising an elongated member having a pair of spaced ends wherein one of said pair of ends includes a distal section which extends in a direction substantially parallel to the central axis, said elongated member and said distal section being formed of a dimension to be inserted into and passed through a punctum opening of an eye;    passing at least the distal section of said implant into and through the punctum opening into the canaliculus;    everting an eyelid of an eye; and    exposing the implant to electromagnetic radiation to form a differential image pattern showing the location of said implant in the eye.    
   
   
       57 . The method of  claim 56  wherein the step of exposing includes exposing the implant to electromagnetic radiation at a selected wavelength to form a differential image pattern showing the location of said implant in the eye.  
   
   
       58 . The method of  claim 57  wherein the step of exposing said implant to electromagnetic radiation includes exposing the implant to electromagnetic radiation which is selected to be at a wavelength selected from the group of infrared, visible light, ultraviolet, X-ray and gamma ray emissions.  
   
   
       59 . The method of  claim 56  wherein the step of passing at least the distal section of said implant into and through the punctum opening into the canaliculus includes an implant having a thin retaining lip which engages the edge of e punctum opening and lip margin to define a punctum plug that occludes the punctum opening.  
   
   
       60 . The method of  claim 56  wherein the step of passing at least the distal section of said implant into and through the punctum opening into the canaliculus includes an implant having a proximal end of a dimension to enabling the implant to be passed through the punctum opening and into the canaliculus to occlude the canaliculus between the punctum opening and the nasal sac.  
   
   
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