US2007135655A1PendingUtilityA1

Use of fluorinated additives in the etching or polishing of integrated circuits

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Assignee: VISCA MARIOPriority: Feb 1, 2002Filed: Jan 22, 2007Published: Jun 14, 2007
Est. expiryFeb 1, 2022(expired)· nominal 20-yr term from priority
Inventors:Mario ViscaAlba ChittofratiFiorenza D'Aprile
H10P 50/667H10P 52/403C11D 1/004C09G 1/02C09K 13/08C11D 2111/22
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Claims

Abstract

Use in etching or polishing of integrated circuits of fluorinated additives of formula (I): T′(C 3 F 6 O) n (CFXO) m T   (I) having a number average molecular weight in the range 250-400, in particular of the compound Cl(CF 2 —CF(CF 3 )O) n CF 2 COONa.

Claims

exact text as granted — not AI-modified
1 . Compounds of formula (II)  
       Cl(CF 2 —CF(CF 3 )O) n CF 2 COOM   (II)  
     wherein M=H, ammonium or a metal ion; n=1.  
   
   
       2 . Compounds according to  claim 1 , wherein M=Li, Na or K.

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