Phototool coating

Abstract

A phototool having a fluorinated phosph(on)ate coating and methods of using the phototool.

1 . A method of patterning a device using a phototool comprising: 
 (a) applying a layer comprising a fluorinated phosph(on)ate material to a first surface of the phototool;    (b) placing the coated first surface of the phototool against the device such that the layer of fluorinated phosph(on)ate is in contact with the device; and    (c) applying radiation to a second surface of the phototool for affecting a pattern in the device.    
     
     
         2 . The method of  claim 1  wherein the fluorinated phosph(on)ate is selected from the group consisting of  
       
         
           
           
               
               
           
         
       
       where the value of n ranges from 3 to about 10.  
     
     
         3 . The method of  claim 1  wherein the fluorinated phosph(on)ate is poly(hexafluoropropyleneoxide-co-difluoromethylene oxide) alcohol ethoxylated phosphate.  
     
     
         4 . The method of  claim 1  wherein the thickness of the layer of the fluorinated phosph(on)ate material is less than or equal to about 6 nm.  
     
     
         5 . The method of  claim 1  wherein the fluorinated phosph(on)ate is applied using a dilute solution in hydrofluoroether solvent.  
     
     
         6 . The method of  claim 5  wherein the dilute solution further comprises a perfluoropolyether silane.  
     
     
         7 . The method of  claim 1  wherein the fluorinated phosph(on)ate comprises a phosphate group.  
     
     
         8 . The method of  claim 1  wherein the fluorinated phosph(on)ate comprises a phosphonate ester, salt, or acid group.  
     
     
         9 . The method of  claim 1  wherein the fluorinated phosph(on)ate comprises a monophosphate ester.  
     
     
         10 . The method of  claim 1  wherein the fluorinated phosph(on)ate comprises a phosphonic acid.  
     
     
         11 . A method of creating patterns in a patternable material comprising 
 (a) applying a layer of a fluorinated phosph(on) ate material to a first surface of a phototool;    (b) applying photoresist to a surface of the patternable material;    (c) placing the first surface of the phototool in contact with the photoresist;    (d) applying radiation to the phototool to form a pattern in the photoresist;    (e) removing a portion of the photoresist to expose a portion of the patternable material surface; and    (f) modifying the exposed surface of the patternable material where the photoresist was removed.    
     
     
         12 . The method of  claim 11  wherein (f) comprises removing material from the exposed surface.  
     
     
         13 . The method of  claim 11  wherein (f) comprises adding material to the exposed surface.  
     
     
         14 . The method of  claim 11  wherein the patternable layer is a dielectric layer.  
     
     
         15 . The method of  claim 11  wherein the patternable layer is a metal layer.