Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus for exposing a substrate. The apparatus includes an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber, disposed adjacent to the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience. When the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.

1 - 13 . (canceled)  
     
     
         14 . An exposure apparatus for exposing a substrate, said apparatus comprising: 
 an optical system being set at a reference temperature, for directing light to the substrate;    an exposure chamber for storing the optical system in a vacuum ambience;    a load-lock chamber disposed adjacent said exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience; and    at least one of a heat insulating material and a heat insulating structure provided between said load-lock chamber and said exposure chamber.    
     
     
         15 . An apparatus according to  claim 14 , wherein the time in which the substrate is introduced into said load-lock chamber and the time in which heating means applies heat to said load-lock chamber are at least partially overlapped with each other.  
     
     
         16 . (canceled)  
     
     
         17 . A device manufacturing method, comprising the steps of: 
 exposing a substrate by use of an exposure apparatus as recited in  claim 14;  and    developing the exposed substrate.