US2007117357A1PendingUtilityA1

Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device

Assignee: ASATSUMA TSUNENORIPriority: Oct 12, 2001Filed: Jan 23, 2007Published: May 24, 2007
Est. expiryOct 12, 2021(expired)· nominal 20-yr term from priority
H10P 14/3416H10P 14/38H10P 14/24H10H 20/825H10H 20/8215H10H 20/01335H10H 20/01H01S 5/2201H01S 5/2036H01S 5/0207H01S 5/22H01S 2301/173C30B 29/406H01S 5/34333B82Y 20/00H01S 5/32341C30B 29/403H01S 5/0213H01S 5/4031H01S 5/2231C30B 25/02
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Claims

Abstract

When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.

Claims

exact text as granted — not AI-modified
1 . A semiconductor light emitting device manufactured by: 
 growing nitride III-V compound semiconductor layers forming a light emitting device structure on a nitride III-V compound semiconductor substrate in which a plurality of second regions having a second average dislocation density higher than a first average dislocation density align regularly in a first region made of a crystal and having the first average dislocation density; and    dicing the nitride III-V compound semiconductor substrate having the nitride III-V compound semiconductor layers grown thereon along border lines including at least neighboring two of the second regions.    
     
     
         2 . The semiconductor light emitting device of  claim 1 , wherein the semiconductor light emitting device is a laser diode.  
     
     
         3 . The semiconductor light emitting device of  claim 1 , wherein the semiconductor light emitting device is a light emitting diode.  
     
     
         4 . A semiconductor device manufactured by: 
 growing nitride III-V compound semiconductor layers forming a device structure on a nitride III-V compound semiconductor substrate in which a plurality of second regions having a second average dislocation density higher than a first average dislocation density align regularly in a first region made of a crystal and having the first average dislocation density; and    dicing the nitride III-V compound semiconductor substrate having the nitride III-V compound semiconductor layers grown thereon along border lines including at least neighboring two of the second regions.    
     
     
         5 . A semiconductor light emitting device manufactured by: 
 growing semiconductor layers forming a light emitting device structure on a semiconductor substrate in which a plurality of second regions having a second average dislocation density higher than a first average dislocation density align regularly in a first region made of a crystal and having the first average dislocation density; and    dicing the semiconductor substrate having the semiconductor layers grown thereon along border lines including at least neighboring two of the second regions.    
     
     
         6 . A semiconductor device manufactured by: 
 growing semiconductor layers forming a device structure on a semiconductor substrate in which a plurality of second regions having a second average dislocation density higher than a first average dislocation density align regularly in a first region made of a crystal and having the first average dislocation density; and    dicing the semiconductor substrate having the semiconductor layers grown thereon along border lines including at least neighboring two of the second regions.    
     
     
         7 . A device manufactured by: 
 growing layers forming a device structure on a substrate in which a plurality of second regions having a second average dislocation density higher than a first average dislocation density align regularly in a first region made of a crystal and having the first average dislocation density; and    dicing the substrate having the layers grown thereon along border lines including at least neighboring two of the second regions.

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