Plating tank

Abstract

Provides a plating tank that can transport platy work securely without causing abrasion and attain uniform plating quality and uniform plating film thickness. The shields are comprised of four shielding plates 108, 109, 112, and 113 on upper part and lower part of the thin plate board as follows. The restrict roller 304 is comprised of the roller stand body 120 which reaches until nearly upper end area's height of thin plate board and stood on upper face of the lower shielding plates 108, and the work-end deviation preventing member 122.

1 . A plating tank for electroplating a platy work, comprising: 
 a treatment tank main body for holding treatment liquids which is arranged as extending in transporting direction of the platy work;    a positive electrode;    a spouter for spouting the treatment liquids to the said platy work from lateral side of the treatment tank main body;    a restrict roller having a plural of rollers, wherein the rollers are attached rotatably from upper part until lower part of the treatment tank main body and arranged consecutively in transporting direction of the platy work as sandwiching both sides of the platy work on moving inside the treatment tank main body;    a current shield for preventing from occurring current concentration on the end of the platy work.    
   
   
       2 . The plating tank according to  claim 1 , wherein the said restrict roller is comprised of a plural of roller stand bodies which are having plural rollers vertically, and arranged in transporting direction of the said plating work, and interval on the spouting position of the spouter between adjacent roller stand bodies are wider than the other intervals.  
   
   
       3 . The plating tank according to  claim 1 , wherein a deviation preventing member is placed at lower end area of the platy work where the spouting position of the spouter is placed as sandwiching both sides of the platy work on moving.  
   
   
       4 . The plating tank according to  claim 1 , wherein the rollers are arranged at least one per predetermined unit area in a region that the restrict rollers are arranged.  
   
   
       5 . The plating tank according to  claim 1 , wherein the said restrict roller is comprised of a plural of roller stand bodies which are having plural rollers vertically, and arranged in transporting direction of the said plating work, and vertical intervals that the rollers of the restrict roller is arranged are range from 50 mm to 100 mm.  
   
   
       6 . The plating tank according to  claim 1 , wherein the said restrict roller is comprised of a plural of roller stand bodies which are having plural rollers vertically, and arranged in transporting direction of the said plating work, and the rollers placed over predetermined height differs the vertical position mutually between the roller stand bodies.  
   
   
       7 . The plating tank according to  claim 1 , wherein the said current shield is comprised of a upper shielding plate for preventing from occurring current concentration on the upper end of the platy work and/or a lower shielding plate for preventing from occurring current concentration on the lower end of the platy work.  
   
   
       8 . The plating tank according to  claim 7 , wherein the said upper shielding plate and/or the lower shielding plate are comprised of plural shielding plates arranged between the said platy work and the said positive electrode, and its overlap with the platy work is the smaller, the closer to the platy work.  
   
   
       9 . The plating tank according to  claim 8 , wherein the said plurality of shielding plates are formed in a unified manner and able to rise and fall.