US2007096342A1PendingUtilityA1
Method for reducing or eliminating semiconductor device wire sweep in a multi-tier bonding device and a device produced by the method
Est. expiryOct 16, 2023(expired)· nominal 20-yr term from priority
Inventors:Rakesh Batish
H10W 90/756H10W 90/754H10W 90/736H10W 74/114H10W 74/00H10W 72/5449H10W 72/5445H10W 72/5363H10W 72/01515H10W 72/951H10W 72/884H10W 72/581H10W 72/555H10W 72/551H10W 72/543H10W 72/536H10W 72/075H10W 70/465H10W 74/473H10W 74/131H10W 70/435H10W 74/016
45
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Claims
Abstract
A method of packaging a multi-tier wire bonded semiconductor device is provided. The method includes applying an insulative material across only a portion of at least two of a plurality of conductors per layer providing interconnection between elements in the multi-tier wire bonded semiconductor device. The method also includes encapsulating the conductors and elements, thereby packaging the semiconductor device.
Claims
exact text as granted — not AI-modified1 . A semiconductor device comprising:
a plurality of semiconductor elements; a plurality of conductors arranged in a multiple tier configuration providing interconnection between the plurality of semiconductor elements; and an insulative material applied across only a portion of at least two of the plurality of conductors in at least two tiers of multiple tiers, the insulative material comprising insulative particles having a diameter smaller than a gap between adjacent ones of the conductors.
2 . The semiconductor device of claim 1 further comprising an encapsulation layer encapsulating the conductors and elements for packaging the semiconductor device.
3 . The semiconductor device of claim 1 wherein the plurality of semiconductor elements includes at least one semiconductor die having a plurality of first contacts, and a lead frame having a plurality of second contacts, the plurality of conductors providing interconnection between the plurality of first contacts and the plurality of second contacts.
4 . The semiconductor device of claim 3 wherein the insulative material is disposed across the portion of the at least two of the plurality of conductors adjacent the semiconductor die.
5 . The semiconductor device of claim 3 wherein the insulative material is disposed across the portion of the at least two of the plurality of conductors approximately midway between the semiconductor die and the leadframe.
6 . The semiconductor device of claim 1 wherein the insulative material is a curable insulative material.
7 . The semiconductor device of claim 1 wherein the insulative material has a bead or bead-like form.
8 . The semiconductor device of claim 1 wherein the insulative material is at least one of a heat induced curable insulative material and a UV radiation curable insulative material.
9 . The semiconductor device of claim 1 wherein the insulative material is comprised of a plurality of spherical silica particles.
10 . The semiconductor device of claim 1 wherein the insulative material is applied around a peripheral portion of an inner element of the semiconductor device.
11 . The semiconductor device of claim 1 wherein the insulative material is at least two distinct substantially circumferential structures around a peripheral portion of an inner element of the semiconductor device, the two structures not being in contact with one another.
12 . The semiconductor device of claim 11 wherein at a first one of the at least two distinct substantially circumferential structures contacts a portion of the inner element and/or a second one of the at least two distinct substantially circumferential structures contacts a portion of a carrier supporting the inner element.
13 . A semiconductor device comprising:
at least one semiconductor element; a carrier for supporting the at least one semiconductor element; a plurality of conductors arranged in a multiple tier configuration providing interconnection between the at least one semiconductor element and the carrier; and an insulative material comprising insulative particles having a diameter smaller than a desired predetermined gap between adjacent ones of the plurality of conductors, the insulative material applied across only a portion of at least two of the plurality of conductors in at least two tiers of the multiple tiers for reducing a potential for short circuiting between adjacent ones of the plurality of conductors.
14 . The semiconductor device of claim 13 wherein the insulative material includes a polymer resin, and the insulative particles are silica particles.
15 . The semiconductor device of claim 13 wherein the insulative material is at least partially cured by at least one of ultraviolet, visible, and infrared radiation.
16 . The semiconductor device of claim 13 wherein the insulative particles occupy between 50 and 85 percent of the weight of the insulative material.
17 . The semiconductor device of claim 13 wherein the insulative particles have a maximum diameter of 20 microns.
18 . The semiconductor device of claim 13 wherein the insulative particles have a median diameter of approximately 4.5 microns.
19 . The semiconductor device of claim 13 wherein the insulative particles have a mean diameter of approximately 4.1 microns.
20 . The semiconductor device of claim 13 wherein the insulative particles provide insulated separation between at least two of the plurality of conductors.
21 . The semiconductor device of claim 13 further comprising an encapsulation layer encapsulating the at least one semiconductor element, the carrier, the plurality of conductors, and the insulative material.
22 . The semiconductor device of claim 21 wherein the encapsulation layer includes an overmold encapsulant.
23 . The semiconductor device of claim 21 wherein the encapsulation layer includes a globtop encapsulant.
24 . The semiconductor device of claim 21 wherein each of the plurality of conductors have a length at least 250 times greater than a diameter of the respective conductor.Join the waitlist — get patent alerts
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