Water-soluble material, chemically amplified resist and pattern formation method using the same

Abstract

A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, and a water-soluble film made of a water-soluble material including a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator is formed on the resist film. Thereafter, pattern exposure is carried out by selectively irradiating the resist film with exposing light through the water-soluble film, the resultant resist film is developed and the water-soluble film is removed. Thus, a resist pattern made of the resist film is formed.

1 . A water-soluble material for forming a water-soluble film on a chemically amplified resist film, comprising: 
 a water-soluble polymer;    an acid generator;    a surface active agent; and    an inclusion compound for incorporating said acid generator.    
   
   
       2 . The water-soluble material of  claim 1 , 
 wherein said inclusion compound is cyclic oligosaccharide.    
   
   
       3 - 20 . (canceled)  
   
   
       21 . The water-soluble material of  claim 2 , 
 wherein said cyclic oligosaccharide is cyclodextrin.    
   
   
       22 . The water-soluble material of  claim 21 , wherein said cyclodextrin is α-cyclodextrin, β-cyclodextrin, γ-cyclodextrin or δ-cyclodextrin.  
   
   
       23 . The water-soluble material of  claim 1 , wherein said water-soluble polymer is polyvinyl alcohol, polyvinyl pyrrolidone, polystyrene sulfonic acid, polyacrylic acid or pullulan.  
   
   
       24 . The water-soluble material of  claim 1 , wherein said surface active agent is a cationic surface active agent or a nonionic surface active agent.