Cleaning method of treatment equipment and treatment equipment

Abstract

In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroacetic acid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.

1 - 10 . (canceled)  
   
   
       11 . A treatment apparatus, comprising: 
 a chamber;    a susceptor mounting a substrate in the chamber;    a first source supplying a treatment agent containing a metal for forming a metal film on the substrate;    a second source supplying a cleaning agent containing one of a carboxylic acid and a derivative of a carboxylic acid for reacting a metal film on an inner wall of the chamber to form a metal complex of the metal and the cleaning agent;    a vaporizer vaporizing the treatment agent and the cleaning agent;    a first pipe supplying the treatment agent from the first source to the vaporizer;    a second pipe supplying the cleaning agent from the second source to the vaporizer;    a third pipe supplying the vaporized treatment agent and the vaporized cleaning agent from the vaporizer to the chamber;    a heater heating the chamber, the third pipe, and the vaporizer; and    a vacuum pump exhausting the chamber,    wherein the metal film is formed on the inner wall of the chamber by the vaporized treatment agent and the metal film on the inner wall is cleaned by the vaporized cleaning agent.    
   
   
       12 - 16 . (canceled)  
   
   
       17 . The treatment apparatus of  claim 11 , wherein the one of the carboxylic acid and the derivative comprises a compound selected from the group comprising RCOOH, RCOOR′, and R(COOH) n , R, R′ are hydrocarbon group containing halogen atom, and n is an integer.  
   
   
       18 . The treatment apparatus of  claim 11 , wherein the carboxylic acid comprises trifluoroacetic acid.  
   
   
       19 . The treatment apparatus of  claim 11 , wherein the metal is copper.  
   
   
       20 . The treatment apparatus of  claim 11 , further comprising a supply unit for supplying an additive to promote formation of the metal complex.  
   
   
       21 . The treatment apparatus of  claim 20 , wherein the additive includes oxygen or water vapor.  
   
   
       22 . The treatment apparatus of  claim 11 , wherein the treatment agent contains CU +1  (hexafluoroacetylacetonate) and silyl olefin ligand.  
   
   
       23 . The treatment apparatus of  claim 11 , wherein the heater heats the susceptor.  
   
   
       24 . The treatment apparatus of  claim 11 , further comprising a drain exhausting the third pipe.  
   
   
       25 . The treatment apparatus of  claim 11 , further comprising a shower head supplying the vaporized treatment agent and the vaporized treatment agent from the third pipe into the chamber.