Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method

Abstract

An alignment mark including a first mark usable for both coarse alignment measurement in a first direction and fine alignment measurement in the first direction, and a second mark usable for coarse alignment measurement in a second direction different from the first direction.

1 - 29 . (canceled)  
   
   
       30 . An alignment mark comprising: 
 a first mark usable for both coarse alignment measurement in a first direction and fine alignment measurement in the first direction; and    a second mark usable for coarse alignment measurement in a second direction different from the first direction.    
   
   
       31 . A mark according to  claim 30 , wherein said first mark comprises a plurality of strip-shaped first measurement marks whose longitudinal directions are parallel.  
   
   
       32 . A mark according to  claim 31 , wherein said second mark comprises a strip-shaped second measurement mark whose longitudinal direction is perpendicular to the longitudinal direction of said first measurement mark.  
   
   
       33 . A mark according to  claim 32 , wherein said second mark is arranged side by side with said first mark in the first direction.  
   
   
       34 . A mark according to  claim 31 , wherein said first mark comprises at least three of said first measurement marks, and said at least three of said first measurement marks have at least two different intervals between a plurality of pairs of said first measurement marks adjacent to each other.  
   
   
       35 . A substrate comprising an alignment mark, wherein said alignment mark comprises: 
 a first mark usable for both coarse alignment measurement in a first direction and fine alignment measurement in the first direction; and    a second mark usable for coarse alignment measurement in a second direction different from the first direction.