US2007060028A1PendingUtilityA1
Cmp slurry delivery system and method of mixing slurry thereof
Est. expiryFeb 25, 2025(expired)· nominal 20-yr term from priority
Inventors:Sheng-Yu ChenTe-Sung HungChi-Piao ChengChung-Jung ChengKaung-Wu NiehPo-Yuan ChengJiann-Fu ChenChun HuTzu-Yu TsengTzu-Yi HsiehHung-Chi PaiYung-Chieh Kuo
C23F 3/00C23F 3/04B24B 57/02B24B 37/04
44
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A CMP slurry delivery system includes a delivery pipe, a first slurry supply reservoir coupled to the delivery pipe for supplying an abrasive, a second slurry supply reservoir coupled to the delivery pipe for supplying a clean chemical, a third slurry supply reservoir coupled to the delivery pipe for supplying a corrosion inhibitor, and a fourth slurry supply reservoir for supplying an oxidizer.
Claims
exact text as granted — not AI-modified1 . A method of mixing slurry comprising:
providing a delivery pipe communicating with a polishing device of a chemical mechanical polishing apparatus at a first end, the delivery pipe further comprising a first inlet, a second inlet, a third inlet, and a fourth inlet, the first inlet being positioned far from the first end, the fourth inlet being positioned closer to the first end, the second inlet and the third inlet being positioned between the first inlet and the fourth inlet; implanting an abrasive into the delivery pipe via the first inlet; implanting a clean chemical into the delivery pipe via the second inlet; implanting a corrosion inhibitor into the delivery pipe via the third inlet; and implanting an oxidizer into the delivery pipe via the fourth inlet; wherein the first inlet, the second inlet, the third inlet, and the fourth inlet each comprise a check valve; and the abrasive, the clean chemical, the corrosion inhibitor, and the oxidizer are rapidly mixed in the delivery pipe and directly delivered to the polishing device.
2 . The method of claim 1 , wherein the second inlet is positioned between the first inlet and the third inlet.
3 . The method of claim 1 , wherein the third inlet is positioned between the first inlet and the second inlet.
4 . The method of claim 1 , wherein the abrasive is selected from a group consisting of alumina, silica, and silica fume.
5 . The method of claim 1 , wherein the oxidizer is selected from a group consisting of hydrogen peroxide and ferric nitrate.
6 . The method of claim 1 , wherein the clean chemical is selected from a group consisting of citric acid and oxalic acid.
7 . The method of claim 1 , wherein the corrosion inhibitor is selected from a group consisting of benzotrazole (BTA), 2-mercapto-benzothiazole (MBT), benzimidazole (BIA), tolyltrizole (TTA), 5-hexyl-1,2,3-benzotriazole (C6BTA), 3-amino-5-heptyl-1,2,4-triazole (AHT), 2-amino-thiazole (AZT), 2-amino-4,6-dimethyl-parimidine (ADMP), 3-phenyl-1,2,4-triazole (PTH), 3-phenyl-1,2,4-triazole-5-one, piperidine, phenyl-amino-triazine-dithiol (PTD), potassium ethylxanthate (KEX), benzylamine (BZA), ethanolamine, and sodium tripolyphosphate.
8 . The method of claim 1 , further comprising a step of purging the delivery pipe with a DI water purger.Join the waitlist — get patent alerts
Track US2007060028A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.