Microfluidic device with controlled substrate conductivity

Abstract

A method to achieve controlled conductivity in microfluidic devices, and a device formed thereby. The method comprises forming a microchannel or a well in an insulating material, and ion implanting at least one region of the insulating material at or adjacent the microchannel or well to increase conductivity of the region.

1 . A microfluidic device, comprising: 
 a first layer made of an insulating material;    a first microchannel formed in said first layer;    at least one of a second microchannel and a well formed in said first layer; and    at least one ion implanted region in said first layer located at or adjacent the first microchannel and said at least one of said second microchannel and said well, said at least one ion implanted region providing a conductive path between said first microchannel and said at least one of the second microchannel and the well.    
     
     
         2 . The device of  claim 1 , wherein said insulating material comprises a silica-based material.  
     
     
         3 . The device of  claim 1 , wherein said insulating material comprises a polymer material.  
     
     
         4 . The device of  claim 1 , wherein said first layer comprises a substrate of the microfluidic device.  
     
     
         5 . The device of  claim 1 , further comprising a second layer bonded to said first layer.  
     
     
         6 . The device of  claim 1 , wherein said first layer comprises a cover plate.  
     
     
         7 . The device of  claim 1 , wherein said insulating material comprises a silica-based material.