Exposure apparatus

Abstract

An exposure apparatus includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first anti-vibration supporting leg which includes a first actuator and supports the first structure, a second structure which supports a substrate stage which aligns the substrate, a second anti-vibration supporting leg which includes a second actuator and supports the second structure, and a control unit which controls at least one of the first actuator and the second actuator to reduce the relative displacement between the first structure and the second structure.

1 . An exposure apparatus which forms a latent image pattern on a substrate using an exposure beam, comprising: 
 a first structure which supports a projection unit which projects an exposure beam onto a substrate;    a first anti-vibration supporting leg which includes a first actuator and supports said first structure;    a second structure which supports a substrate stage which aligns the substrate;    a second anti-vibration supporting leg which includes a second actuator and supports said second structure; and    a control unit which controls at least one of said first actuator and said second actuator to reduce a relative displacement between said first structure and said second structure.    
     
     
         2 . The apparatus according to  claim 1 , wherein said first actuator so operates as to reduce vibration of said first structure.  
     
     
         3 . The apparatus according to  claim 1 , further comprising a state detector which detects a state of said first structure, 
 wherein said control unit controls said first actuator on the basis of the state of said first structure.    
     
     
         4 . The apparatus according to  claim 1 , wherein said second actuator so operates as to reduce vibration of said second structure.  
     
     
         5 . The apparatus according to  claim 1 , further comprising a state detector which detects a state of said second structure, 
 wherein said control unit controls said second actuator on the basis of the state of said second structure.    
     
     
         6 . The apparatus according to  claim 1 , wherein 
 the projection unit includes an original stage which aligns an original, and a projection optical system which projects a pattern of the original onto the substrate using the exposure beam,    the exposure apparatus further comprises:    a first stage state detector which detects a state of the original stage; and    a first stage actuator which drives the original stage relative to said first structure, and    said control unit drives said first stage actuator on the basis of the state of the original stage.    
     
     
         7 . The apparatus according to  claim 1 , further comprising: 
 a second stage state detector which detects a state of the substrate stage; and    a second stage actuator which drives the substrate stage relative to said second structure,    wherein said control unit drives said second stage actuator on the basis of the state of the substrate stage.    
     
     
         8 . The apparatus according to  claim 6 , wherein said control unit synchronously drives the original stage and the substrate stage.  
     
     
         9 . The apparatus according to  claim 1 , further comprising a relative displacement detector which detects the relative displacement between said first structure and said second structure, 
 wherein said control unit controls, on the basis of information sent from said relative displacement detector, at least one of said first actuator and said second actuator to reduce the relative displacement between said first structure and said second structure.    
     
     
         10 . The apparatus according to  claim 1 , wherein said control unit corrects a driving signal of said second actuator on the basis of a control signal of said first actuator, and corrects a driving signal of said first actuator on the basis of a control signal of said second actuator, thereby reducing the relative displacement between said first structure and said second structure.  
     
     
         11 . The apparatus according to  claim 1 , wherein said control unit corrects a driving signal of said first actuator on the basis of a control signal of said second actuator, thereby allowing said first structure to follow said second structure.  
     
     
         12 . The apparatus according to  claim 1 , wherein said control unit corrects a driving signal of said second actuator on the basis of a control signal of said first actuator, thereby allowing said second structure to follow said first structure.  
     
     
         13 . The apparatus according to  claim 9 , wherein said control unit controls both said first actuator and said second actuator on the basis of the information sent from said relative displacement detector, thereby reducing the relative displacement between said first structure and said second structure.  
     
     
         14 . The apparatus according to  claim 9 , wherein said control unit controls said first actuator on the basis of the information sent from said relative displacement detector, thereby allowing said first structure to follow said second structure.  
     
     
         15 . The apparatus according to  claim 9 , wherein said control unit controls said second actuator on the basis of the information sent from said relative displacement detector, thereby allowing said second structure to follow said first structure.  
     
     
         16 . A device manufacturing method comprising steps of: 
 preparing a substrate on which a latent image pattern is formed using an exposure apparatus defined in  claim 1;  and    developing the latent image pattern.