Electron beam apparatus, and inspection instrument and inspection process thereof

Abstract

A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs an electric signal of the specimen image from the secondary beam, an image processor generates image information of the specimen by processing the electric signal output by the sensor, and a host computer generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate.

1 . A beam inspection apparatus, comprising: 
 a beam source that discharges an electron beam;    a primary optical system that directs the electron beam to a specimen, the primary optical system has a primary polarizer and an aperture;    a secondary optical system that guides a secondary beam coming from the specimen;    a sensor that outputs an electric signal of the specimen image from the secondary beam; and    an image processor that generates image information of the specimen by processing the electric signal output by the sensor;    wherein the primary polarizer applies a blanking voltage for preventing the electron beam from passing the aperture when the primary polarizer receives a notice from a host computer.    
     
     
         2 . The beam inspection apparatus according to  claim 1 , wherein the host computer measures an actual dosage at the specimen, and outputs the notice when the host computer detects that the actual dosage is greater than a predetermined value.  
     
     
         3 . The beam inspection apparatus according to  claim 1 , wherein the host computer outputs the notice based on a relation between the secondary beam and a dosage of the specimen.  
     
     
         4 . The beam inspection apparatus according to  claim 1 , wherein the host computer outputs the notice based on a contrast ratio of the image information generated by the image processor.  
     
     
         5 . A beam inspection apparatus comprising: 
 a beam source that discharges an electron beam;    a primary optical system that directs the electron beam to a specimen, the primary optical system has a primary polarizer and an aperture;    a secondary optical system that guides a secondary beam coming from the specimen;    a sensor that outputs an electric signal of the specimen image from the secondary beam;    an image processor that generates image information of the specimen by processing the electric signal output by the sensor; and    a driving mechanism to move the aperture for preventing the electron beam from passing the aperture when the driving mechanism receives a notice from a host computer.    
     
     
         6 . The beam inspection apparatus according to  claim 5 , wherein the host computer measures an actual dosage at the specimen, and outputs the notice when the host computer detects that the actual dosage is greater than a predetermined value.  
     
     
         7 . The beam inspection apparatus according to  claim 5 , wherein the host computer outputs the notice based on a relation between the secondary beam and a dosage of the specimen.  
     
     
         8 . The beam inspection apparatus according to  claim 5 , wherein the host computer outputs the notice based on a contrast ratio of the image information generated by the image processor.