Abatement of fluorine gas from effluent

Abstract

An effluent abatement system 200 that may be used to abate F 2 gas content of effluent exhausted from a process chamber 35 , such as effluent from a CVD chamber cleaning process, includes a catalytic reactor 250 to reduce the content of F 2 in the effluent 100 . The system may further include a prescrubber 230 to add reactive gases to the effluent 100 and/or to treat the effluent 100 prior to treatment in the catalytic reactor 250 . Alternatively reactive gases can be added to the effluent 100 by a gas source 220.

1 . A substrate processing apparatus comprising: 
 (a) a process chamber capable of performing a process with a process gas and thereby forming an effluent gas comprising F 2  gas, the chamber comprising: 
 (i) a substrate support;  
 (ii) a gas distributor;  
 (iii) a gas energizer; and  
 (iv) an exhaust; and  
   (b) a catalytic reactor to treat the effluent gas to reduce the F 2  content thereof.