System for purging high purity interfaces

Abstract

In one embodiment, a system for purging high purity interfaces comprises a first manifold in flow communication with a high purity container and a second manifold. The first manifold comprises a first diaphragm valve connected to the container, to a first end of the second manifold and to sources of vacuum and vent. The first manifold further comprises a second diaphragm valve connected to the container and to second and third ends of the second manifold. A third diaphragm valve is interposed between the second diaphragm valve and the third end, and a fourth diaphragm valve is interposed between the first diaphragm valve and the sources of vacuum and vent.

1 . A system for purging high purity interfaces, the system comprising: 
 a first manifold in flow communication with a high purity container and with a second manifold;    the high purity container comprising an inlet port and an outlet port;    the first manifold comprising, 
 a first diaphragm valve in flow communication with the inlet port at one side, the first diaphragm valve being further in flow communication with a first end of the second manifold and with sources of vacuum and vent at the other side, a fourth diaphragm valve being interposed between the first diaphragm valve and the sources of vacuum and vent, and  
 a second diaphragm valve in flow communication with the outlet port at one side, and with a second and a third ends of the second manifold at the other side, a third diaphragm valve being interposed between the second diaphragm valve and the third end;  
   the first end being connected to sources of a high purity chemical, push gas, and purge gas, one or more diaphragm valves being interposed between the first end and the sources of the high purity chemical, push gas, and purge gas;    the second end being connected to a manufacturing tool and to sources of vacuum and vent, one or more diaphragm valves being interposed between the second end and the manufacturing tool and the sources of vacuum and vent; and    the third end being connected to the sources of vacuum and vent, one or more diaphragm valves being interposed between the third end and the vacuum and vent sources.    
   
   
       2 . The system of  claim 1 , wherein the first manifold is detachably connected to the high purity container.  
   
   
       3 . The system of  claim 1 , 
 wherein each of the diaphragm valves has a seat side and a diaphragm side,    wherein the seat side of the first diaphragm valve is oriented in the direction of the first end,    wherein the seat side of the second diaphragm valve is oriented in the direction of the second end, and    wherein the seat side of the fourth diaphragm valve is oriented in the direction of the first diaphragm valve.    
   
   
       4 . The system of  claim 3 , wherein the third diaphragm valve is connected to the diaphragm side of the second diaphragm valve.  
   
   
       5 . The system of  claim 3 , wherein the fourth diaphragm valve is connected to the seat side of the first diaphragm valve.  
   
   
       6 . The system of  claim 1 , wherein the fourth diaphragm valve is connected to the diaphragm side of the first diaphragm valve.  
   
   
       7 . The system of  claim 1 , wherein the first and the second manifolds are detachably connected at the first, second, and third ends.  
   
   
       8 . The system of  claim 7 , wherein the first and the second manifolds are detachably connected with low dead space fittings.  
   
   
       9 . The system of  claim 1 , wherein the second manifold comprises, 
 a fifth diaphragm valve in flow communication with the first end at one side and to the sources of push gas, purge gas, vent, and vacuum at the other side, the fifth diaphragm valve being further in flow communication with the source of the high purity chemical at the one side and to a sixth diaphragm valve at the other side,    a seventh diaphragm valve in flow communication with the source of push gas and the fifth diaphragm valve at one side, and to the sources of purge gas and the sources of vacuum and vent at the other side, an eighth diaphragm valve being interposed between the seventh diaphragm valve and the source of push gas, the sixth diaphragm valve being connected with the fifth diaphragm valve and the sources of vent and vacuum at one side, and the second end and the manufacturing tool at the other side, a ninth diaphragm valve being interposed between the sixth diaphragm valve and the sources of vent and vacuum,    a tenth diaphragm valve connected to the source of purge gas and the seventh diaphragm valve at one side, and with the ninth diaphragm valve and the sources of vent and vacuum at the other side, a flow constrictor being in flow communication with the tenth diaphragm valve at one side, and to the sources of purge gas and the seventh diaphragm valve at the other side, and    an eleventh diaphragm valve in flow communication with the sources of vent and vacuum at one side, and with the third end and the tenth diaphragm valve at the other side, a twelfth diaphragm valve being interposed between the third end and the eleventh diaphragm valve, a thirteenth diaphragm valve being interposed between the tenth and the eleventh diaphragm valves.    
   
   
       10 . The system of  claim 9 , 
 wherein the seat side of the fifth valve is oriented in the direction of the source of the seventh valve,    wherein the seat side of the sixth diaphragm valve is oriented in the direction of the third end, and    wherein the seat side of the eleventh diaphragm valve is oriented in the direction of the twelfth and thirteenth diaphragm valves.    
   
   
       11 . The system of  claim 10 , wherein a pressure transducer is positioned between the seventh and the eighth diaphragm valves, and wherein a vacuum transducer is positioned between the tenth and the thirteenth diaphragm valves.  
   
   
       12 . The system of  claim 9 , wherein a chemical inflow diaphragm valve regulates the flow of the high purity chemical from the source of the high purity chemical to the second manifold, and wherein a chemical outflow diaphragm valve regulates the flow of the high purity chemical from the second manifold to the manufacturing tool.  
   
   
       13 . The system of  claim 12 , wherein the chemical inflow valve has the diaphragm side oriented in the direction of the source of the high purity chemical, and wherein the chemical outflow valve has the diaphragm side oriented in the direction of the manufacturing tool.  
   
   
       14 . The system of  claim 9 , 
 wherein the high purity container stores the high purity chemical,    wherein a fourteenth valve is interposed between the sixth diaphragm valve and the second end, regulating delivery of the high purity chemical to the manufacturing tool,    wherein the high purity chemical is further stored in an intermediate container situated between the high purity container and the manufacturing tool,    wherein a third manifold is in flow communication with the intermediate container and with a fourth manifold, the third manifold comprising a plurality of diaphragm valves disposed in relation to the intermediate container and the fourth manifold as the diaphragm valves in the first manifold in relation to the high purity container and the second manifold, and    wherein the fourth manifold is in flow communication with the manufacturing tool and to sources of push gas, purge gas, vacuum, and vent.    
   
   
       15 . The system of  claim 14 , wherein the third manifold is detachably connected to the intermediate container.  
   
   
       16 . The system of  claim 1 , wherein the fourth diaphragm valve is connected to the sources of vacuum and vent by being in flow communication with the third diaphragm valve.  
   
   
       17 . The system of  claim 16 , wherein the fourth diaphragm valve is connected to the sources of vacuum and vent by being in flow communication with the third diaphragm valve and with the side of the second diaphragm valve oriented in the direction of the high purity container.  
   
   
       18 . The system of  claim 16 , wherein the fourth diaphragm valve is connected to the sources of vacuum and vent by being in flow communication with the side of the third diaphragm valve oriented in the direction of the third end.  
   
   
       19 . The system of  claim 1 , wherein the fifth diaphragm valve is further in flow communication with a solvent delivery system, and wherein the twelfth and thirteenth diaphragm valves are further in flow communication with a solvent recovery system.  
   
   
       20 . The system of  claim 19 , wherein the solvent delivery system is mobile or stationary.  
   
   
       21 . The system of  claim 19 , wherein the solvent delivery system is refill capable.  
   
   
       22 . The system of  claim 1 , wherein the system is adapted for delivering a high purity chemical in liquid form to the manufacturing tool.  
   
   
       23 . The system of  claim 1 , wherein the system is adapted for delivering a high purity chemical in vapor form to the manufacturing tool.  
   
   
       24 . The system of  claim 23 , wherein the second diaphragm valve is in flow communication with the outlet port at one side, and with the third end and the third diaphragm valve at the other side.  
   
   
       25 . The system of  claim 23 , wherein the fourth diaphragm valve is in flow communication at one side with the side of the first diaphragm valve oriented in the direction of the inlet port, and at the other side with the side of the second diaphragm valve oriented in the direction of the second end.  
   
   
       26 . The system of  claim 1 , wherein two or more diaphragm valves are structured as multi-valve blocks.  
   
   
       27 . The system of  claim 1 , wherein one or more diaphragm valves are surface mounted on a component block.