US2007015892A1PendingUtilityA1

Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film

Assignee: JSR CORPPriority: Jan 16, 2004Filed: Jul 12, 2006Published: Jan 18, 2007
Est. expiryJan 16, 2024(expired)· nominal 20-yr term from priority
H10P 14/6686H10P 14/6342H10P 14/6922H01B 3/30C09D 183/14H01B 3/46C08L 83/14C08J 5/22C08G 77/48
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Claims

Abstract

A method for producing a polymer includes hydrolyzing and condensing (B) a hydrolyzable-group-containing silane monomer in the presence of (A) a polycarbosilane, the polycarbosilane (A) being a polymer (I) obtained by reacting (a) a compound shown by the following general formula (1) and (b) at least one compound selected from the group consisting of a compound shown by the following general formula (2) and a compound shown by the following general formula (3) in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal, R 1 k CX 4-k   (1) R 2 k SiY 4-k   (2) R 3 m Y 3-m SiCR 4 n X 3-n   (3) wherein R 1 to R 4 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, k represents an integer from 0 to 3, and m and n individually represent integers from 0 to 2.

Claims

exact text as granted — not AI-modified
1 . A method for producing a polymer, comprising hydrolyzing and condensing (B) a hydrolyzable-group-containing silane monomer in the presence of (A) a polycarbosilane, the polycarbosilane (A) being a polymer (I) obtained by reacting (a) a compound shown by the following general formula (1) and (b) at least one compound selected from the group consisting of a compound shown by the following general formula (2) and a compound shown by the following general formula (3) in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal,  
       R 1   k CX 4-k   (1)  R 2   k SiY 4-k   (2)  R 3   m Y 3-m SiCR 4   n X 3-n   (3)  wherein R 1  to R 4  individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, k represents an integer from 0 to 3, and m and n individually represent integers from 0to 2.    
   
   
       2 . The method according to  claim 1 , 
 wherein the hydrolyzable-group-containing silane monomer (B) is at least one silane compound selected from the group consisting of a compound shown by the following general formula (4),      R 5   a SiX 4-a   (4)    wherein R 5  represents a hydrogen atom, a fluorine atom, or a monovalent organic group, X represents a halogen atom or an alkoxy group, and a represents an integer from 0 to 3, and a compound shown by the following general formula (5),      R 6   b Y 3-b Si—(R 8 ) d —SiZ 3-c R 7   c   (5)    wherein R 6  and R 7  individually represent monovalent organic groups, b and c individually represent integers from 0 to 2, R 8  represents an oxygen atom, a phenylene group, or a group shown by —(CH 2 ) e — (wherein e represents an integer from 1 to 6), Y and Z individually represent a halogen atom or an alkoxy group, and d represents 0 or 1.    
   
   
       3 . A polymer obtained by the method according to  claim 1 .  
   
   
       4 . A polymer obtained by the method according to  claim 2 .  
   
   
       5 . An insulating-film-forming composition, comprising the polymer according to  claim 3  and an organic solvent.  
   
   
       6 . An insulating-film-forming composition, comprising the polymer according to  claim 4  and an organic solvent.  
   
   
       7 . A method for producing an insulating film, comprising applying the insulating-film-forming composition according to  claim 5  to a substrate, and heating the applied composition at 30 to 450° C.  
   
   
       8 . A method for producing an insulating film, comprising applying the insulating-film-forming composition according to  claim 6  to a substrate, and heating the applied composition at 30 to 450° C.  
   
   
       9 . A silica-based insulating film obtained by the method according to  claim 7 .  
   
   
       10 . A silica-based insulating film obtained by the method according to  claim 8.

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