Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment

Abstract

To provide a pattern forming method enabling a thin film to be patterned with high precision by easy and low cost techniques. A thin film 2 is provided on a base material 1 containing a sublimable dyestuff, light is irradiated to the base material 1 , and heat generated by the light irradiation sublimates the sublimable dyestuff in a desired region, thereby removing the thin film 2 corresponding to an irradiation region where the light is irradiated to thereby pattern this thin film 2.

1 . An electro-optic device having a wiring pattern formed by a method of pattern forming comprising: 
 providing a thin film on a base material containing a sublimable material;    irradiating light to the base material; and    sublimating the sublimable material in a desired region by heat generated by the light irradiation,    so as to remove the thin film corresponding to an irradiation region where the light is irradiated to thereby pattern the thin film to form the wiring pattern on the base material.    
     
     
         2 . Electronic equipment comprising the electro-optic device according to  claim 1.