US2007004322A1PendingUtilityA1

Polishing composition and polishing method

Assignee: OHASHI KEIGOPriority: Nov 26, 2003Filed: Sep 5, 2006Published: Jan 4, 2007
Est. expiryNov 26, 2023(expired)· nominal 20-yr term from priority
C09G 1/02G11B 5/8404B24B 37/044
52
PatentIndex Score
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Cited by
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Claims

Abstract

A polishing composition contains silicon dioxide, an alkaline compound, and water. Silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The alkaline compound is, for example, ammonium carbonate, potassium carbonate, sodium carbonate, ammonium hydrogen carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, ammonium phosphate, potassium phosphate, sodium phosphate, ammonium hydrogen phosphate, potassium hydrogen phosphate, or sodium hydrogen phosphate. The polishing composition can be suitably used in applications for polishing a glass substrate.

Claims

exact text as granted — not AI-modified
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       10 . The method according to  claim 18 , wherein the alkaline compound is ammonium carbonate, potassium carbonate, sodium carbonate, ammonium hydrogen carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, ammonium phosphate, potassium phosphate, sodium phosphate, ammonium hydrogen phosphate, potassium hydrogen phosphate, sodium hydrogen phosphate, potassium pyrophosphate, sodium pyrophosphate, potassium citrate, potassium hydrogen citrate, potassium gluconate, potassium succinate, ammonium acetate, potassium oxalate, ammonium hydrogen oxalate, ammonium tartrate, potassium tartrate, ammonium hydrogen tartrate, potassium sodium tartrate, potassium sorbate, calcium nitrate, potassium ferricyanide, ammonium fluoride, potassium fluoride, calcium fluoride, potassium hydroxide, ammonium hydroxide, or tetramethyl ammonium hydroxide.  
   
   
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       13 . The method according to  claim 18 , further comprising an oxidizing agent.  
   
   
       14 . The method according to  claim 13 , wherein the oxidizing agent is hydrogen peroxide, ammonium persulfate, potassium chlorate, potassium perchlorate, sodium perchlorate, potassium periodate, sodium periodate, potassium bromate, or sodium bromate  
   
   
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       18 . A method for polishing a glass substrate, the method comprising: 
 preparing a polishing composition comprising silicon dioxide, an alkaline compound, and water; and    polishing the surface of a glass substrate, using the prepared polishing composition.    
   
   
       19 . The method for polishing a glass substrate according to  claim 18 , wherein said polishing the surface of a glass substrate comprises: 
 preliminarily polishing the surface of the glass substrate; and    finish-polishing the surface of the preliminarily polished glass substrate, in which    the polishing composition is used in the finish-polishing of the surface of the preliminarily polished glass substrate.    
   
   
       20 . The method for polishing a glass substrate according to  claim 18 , wherein said preparing a polishing composition comprises diluting the polishing composition with water.

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