Gold-semiconductor phase change memory for archival data storage
Abstract
A structure for storing digital data is provided, with a high reflectance layer comprising a gold film formed over a semiconductor layer, and a plurality of low reflectance portions comprising a mixture of a gold material and a semiconductor material. The plurality of low reflectance portions have top surfaces comprising more semiconductor material than the gold material. The invention also provides a method of changing reflectance on a data storage disk, comprising irradiating a laser light beam onto a gold film formed over a semiconductor layer, and raising the temperature of the gold film above a eutectic temperature for a mixture of gold and the semiconductor layer.
Claims
exact text as granted — not AI-modified1 . A data storage medium comprising:
a first material layer; and a second light reflective material layer formed over said first material layer and having a first light reflectance property, said first and second material layers having a property that a light beam applied to a region of said second material layer heats said first and second material layers at said region to cause a mixture of materials from said first and second material layers and a second light reflectance property for said region which is different from said first light reflectance property.
2 . The data storage medium of claim 1 , wherein said second light reflective material layer is a gold containing film formed to a thickness of about 50 Å to about 300 Å.
3 . The data storage medium of claim 1 , wherein said first material layer is a semiconductor layer formed to a thickness of about 200 Å to about 2000 Å.
4 . The data storage medium of claim 1 , wherein said first light reflectance property is higher than said second light reflectance property.
5 . The data storage medium of claim 1 , further comprising a dielectric layer under said first material layer.
6 . The data storage medium of claim 1 , further comprising a protective layer over said second light reflective material layer.
7 . The data storage medium of claim 6 , wherein said protective layer comprises a silicon dioxide layer formed to a thickness of about 300 Å to about 1000 Å.
8 . The data storage medium of claim 1 , further comprising a substrate over said second light reflective material layer.
9 . The data storage medium of claim 1 , wherein said first material layer comprises a silicon layer.
10 . The data storage medium of claim 1 , wherein said first material layer comprises a silicon material and said second light reflective material layer comprises a gold material, and said mixture of materials comprises more of said silicon material than said gold material.
11 . The data storage medium of claim 1 , wherein said first material layer comprises a germanium layer.
12 . The data storage medium of claim 1 , wherein said first material layer comprises a germanium material and said second light reflective material layer comprises a gold material, and said mixture of materials comprises more of said germanium material than said gold material.
13 . The data storage medium of claim 1 , wherein said mixture of materials is in a meta-stable phase.
14 . The data storage medium of claim 1 , wherein said medium is a disk.
15 . A data storage medium comprising:
a first dielectric layer; a semiconductor layer formed over said first dielectric layer; a gold containing film formed over said semiconductor layer; and a mixed material portion in said gold containing film and said semiconductor layer, said mixed material portion comprising a mixture of gold material and semiconductor material.
16 . The data storage medium of claim 15 , wherein said gold containing film is formed to a thickness of about 50 Å to about 300 Å.
17 . The data storage medium of claim 15 , wherein said semiconductor layer is formed to a thickness of about 200 Å to about 2000 Å.
18 . The data storage medium of claim 15 , wherein said mixed material portion has a first reflectance value and said gold containing film has a second reflectance value higher than said first reflectance value.
19 . The data storage medium of claim 15 , wherein said first dielectric layer has a first thermal conductivity and said semiconductor layer has a second thermal conductivity higher than said first thermal conductivity.
20 . The data storage medium of claim 15 , wherein said first dielectric layer comprises a silicon dioxide layer.
21 . The data storage medium of claim 15 , further comprising a second dielectric layer over said gold containing film.
22 . The data storage medium of claim 21 , wherein said second dielectric layer comprises a silicon dioxide layer.
23 . The data storage medium of claim 15 , further comprising a substrate over said gold containing film.
24 . The data storage medium of claim 15 , wherein said semiconductor layer comprises a silicon layer.
25 . The data storage medium of claim 15 , wherein said semiconductor material comprises a silicon material, and said mixed material portion comprises more of said silicon material than said gold material.
26 . The data storage medium of claim 15 , wherein said semiconductor layer comprises a germanium layer.
27 . The data storage medium of claim 15 , wherein said semiconductor material comprises a germanium material, and said mixed material portion comprises more of said germanium material than said gold material.
28 . The data storage medium of claim 15 , wherein said mixed material portion is in a meta-stable phase.
29 . The data storage medium of claim 15 , wherein said medium is a disk.
30 . A data storage medium, comprising:
a high reflectance layer comprising a gold film formed over a semiconductor layer; and a plurality of low reflectance portions comprising a mixture of a gold material and a semiconductor material.
31 . The data storage medium according to claim 30 , wherein said plurality of low reflectance portions have top surfaces comprising more semiconductor material than said gold material.
32 . The data storage medium according to claim 30 , wherein said semiconductor material comprises a silicon material.
33 . The data storage medium according to claim 30 , wherein said semiconductor material comprises a germanium material.
34 . The data storage medium according to claim 30 , wherein said semiconductor layer is a silicon layer.
35 . The data storage medium according to claim 30 , wherein said semiconductor layer is a germanium layer.
36 . The data storage medium according to claim 30 , wherein said high reflectance layer is between about 50 Å to about 300 Å thick.
37 . The data storage medium according to claim 30 , further comprising a dielectric layer underneath said semiconductor layer and another dielectric layer over said high reflectance layer.
38 . The data storage medium according to claim 30 , further comprising a dielectric layer underneath said semiconductor layer and a substrate over said high reflectance layer.
39 . The data storage medium according to claim 30 , wherein said medium is a disk.
40 . A data storage medium comprising:
a first dielectric layer; a semiconductor layer formed over said first dielectric layer; and a gold containing film formed over said semiconductor layer.
41 . The data storage medium of claim 40 , wherein said gold containing film is formed to a thickness of about 50 Å to about 300 Å.
42 . The data storage medium of claim 40 , wherein said semiconductor layer is formed to a thickness of about 200 Å to about 2000 Å.
43 . The data storage medium of claim 40 , wherein said first dielectric layer has a first thermal conductivity and said semiconductor layer has a second thermal conductivity higher than said first thermal conductivity.
44 . The data storage medium of claim 40 , wherein said first dielectric layer comprises a silicon dioxide layer formed to a thickness of about 300 Å to about 1000 Å.
45 . The data storage medium of claim 40 , further comprising a second dielectric layer over said gold film.
46 . The data storage medium of claim 45 , wherein said second dielectric layer comprises a silicon dioxide layer.
47 . The data storage medium of claim 40 , further comprising a polycarbonate substrate over said gold film.
48 . The data storage medium of claim 40 , wherein said semiconductor layer comprises a silicon layer.
49 . The data storage medium of claim 40 , wherein said semiconductor layer comprises a germanium layer.
50 . The data storage medium of claim 40 , wherein said medium is a disk.
51 . A system for writing data to a recording medium, comprising:
an optical recording medium comprising a first dielectric layer, a semiconductor layer formed over said first dielectric layer, and a gold containing film formed over said semiconductor layer; and a device capable of irradiating a laser beam onto the medium, and producing regions in said medium containing a mixture of material from said gold containing film and said semiconductor layer.
52 . The system of claim 51 , wherein said laser beam is capable of melting said gold layer and said semiconductor layer.
53 . The system of claim 51 , wherein said laser beam is capable of reading written data from said medium.
54 . The system of claim 51 , wherein said device is capable of detecting a difference in reflectance of said laser beam between said gold containing film and an area containing a mixture of said semiconductor layer and said gold containing film.
55 . The system of claim 51 , wherein said medium is a disk.
56 . A method of writing data to a medium, comprising:
providing a disk having a dielectric layer, a semiconductor layer over said dielectric layer, and a gold film over said semiconductor layer having a predetermined reflectivity; and irradiating a laser light beam onto said gold film with sufficient energy to diffuse said gold film into said semiconductor layer to create an area having a reflectivity lower than said predetermined reflectivity.
57 . The method of claim 56 , wherein said semiconductor layer comprises a silicon semiconductor layer, and said act of irradiating said laser light beam comprises raising a temperature of said gold film and said silicon semiconductor layer above a eutectic temperature for a gold-silicon mixture.
58 . The method of claim 56 , wherein said semiconductor layer comprises a germanium semiconductor layer, and said act of irradiating said laser light beam comprises raising a temperature of said gold film and said germanium semiconductor layer above a eutectic temperature for a gold-germanium mixture.
59 . The method of claim 56 , wherein said gold film has a thickness of between about 50 Å to about 300 Å.
60 . The method of claim 56 , wherein said semiconductor layer has a thickness of between about 200 Å to about 2000 Å.
61 . The method of claim 56 , wherein said dielectric layer is a silicon dioxide layer having a thickness of between about 300 Å to about 1000 Å.
62 . The method of claim 56 , wherein said act of irradiating said laser light beam comprises raising a temperature of said gold film to at least 400° C.
63 . The method of claim 56 , wherein said act of irradiating said laser light beam comprises irradiating a light beam having a wavelength in the range of 405 nm and 480 nm.
64 . The method of claim 56 , further comprising cooling said gold film and said semiconductor layer after said act of irradiating.
65 . The method of claim 64 , wherein said act of cooling comprises cooling through dissipation of heat into material layers underneath said semiconductor layer.
66 . The method of claim 65 , wherein said material layers underneath said semiconductor layer dissipate said heat such that a temperature of said gold film and said semiconductor layer is reduced to a temperature below a eutectic temperature in no longer than approximately 100 nanoseconds.
67 . The method of claim 56 wherein said medium is a disk.
68 . The method of claim 56 wherein said irradiating a laser light beam comprises irradiation a blue light laser beam.
69 . A method of changing reflectance on a data storage medium, comprising:
irradiating a laser light beam onto a gold film formed over a semiconductor layer to raise a temperature of said gold film above a eutectic temperature for a mixture of gold and said semiconductor layer, thereby creating a mixture of material from said gold film and material from said semiconductor layer; and cooling said mixture; whereby said irradiating and cooling acts to produce a top surface on said cooled mixture containing more of said material from said semiconductor layer than said material from said gold film.
70 . The method of claim 69 , wherein said irradiating said laser light beam comprises irradiating a laser beam having a wave length in the range of approximately 405 nm to approximately 480 nm.
71 . The method of claim 69 , wherein said semiconductor layer comprises a silicon layer.
72 . The method of claim 69 , wherein said semiconductor layer comprises a germanium layer.
73 . The method of claim 69 , wherein said data storage medium is a disk.
74 . The method of claim 69 , wherein said irradiating a laser light beam comprises irradiating a blue laser light beam.Join the waitlist — get patent alerts
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