Exposure apparatus and device fabrication method

Abstract

An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed. Leakage or entrance of a liquid used for exposure into an optical measurement device such as a wavefront aberration measurement device can be prevented, thereby enabling preferable optical adjustment such as imaging performance or optical characteristics.

1 . An exposure apparatus in which a gap between a projection optical system and a substrate which is held by a stage apparatus is filled with a liquid, and a pattern image is projected via the projection optical system and the liquid onto the substrate, so as to expose the substrate, wherein the stage apparatus has: 
 a setting portion for setting a measurement device which is detachably attachable to the stage apparatus; and    a light-transmissive member which is arranged on an optical path of measurement light of the measurement device when the measurement device is set at the setting portion.    
   
   
       2 . The exposure apparatus in accordance with  claim 1 , wherein the setting portion and the light-transmissive member are provided at a peripheral edge of the stage apparatus.  
   
   
       3 . The exposure apparatus in accordance with  claim 1 , wherein the light-transmissive member has a recessed or protruding part formed on an upper surface thereof, so as to hold the liquid.  
   
   
       4 . The exposure apparatus in accordance with  claim 1 , wherein an upper surface of the light-transmissive member is liquid-repellent.  
   
   
       5 . The exposure apparatus in accordance with  claim 1 , wherein positions of an upper surface of the stage apparatus and an upper surface of the light-transmissive member are substantially the same along an optical axis of the projection optical system.  
   
   
       6 . The exposure apparatus in accordance with  claim 5 , wherein the position of the upper surface of the light-transmissive member substantially coincides with a position of an upper surface of the substrate held by the stage apparatus, along the optical axis of the projection optical system.  
   
   
       7 . The exposure apparatus in accordance with  claim 1 , wherein the light-transmissive member is one of optical elements as constituents of the measurement device.  
   
   
       8 . The exposure apparatus in accordance with  claim 7 , wherein the light-transmissive member has a lens.  
   
   
       9 . The exposure apparatus in accordance with  claim 1 , wherein the measurement device performs measurement while the upper surface of the light-transmissive member is covered with the liquid.  
   
   
       10 . An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, comprising: 
 a stage apparatus which is movable with respect to an optical axis of the exposure light;    a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and    a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed.    
   
   
       11 . The exposure apparatus in accordance with  claim 10 , wherein the measurement device is detachably attachable to the stage apparatus.  
   
   
       12 . The exposure apparatus in accordance with  claim 10 , further comprising a measurement mechanism for moving the measurement device to a position below the light-transmissive member.  
   
   
       13 . The exposure apparatus in accordance with  claim 10 , wherein the substrate is held by the stage apparatus.  
   
   
       14 . The exposure apparatus in accordance with  claim 10 , further comprising: 
 a projection optical system, wherein exposure is performed while a gap between the projection optical system and the substrate is filled with the liquid.    
   
   
       15 . The exposure apparatus in accordance with  claim 10 , wherein the light-transmissive member is positioned on an optical path of measurement light of the measurement device.  
   
   
       16 . The exposure apparatus in accordance with  claim 10 , wherein the light-transmissive member is one of optical elements as constituents of the measurement device.  
   
   
       17 . The exposure apparatus in accordance with  claim 16 , wherein the light-transmissive member has a lens.  
   
   
       18 . The exposure apparatus in accordance with  claim 10 , wherein the light-transmissive member is detachably attachable to the stage apparatus.  
   
   
       19 . The exposure apparatus in accordance with  claim 10 , wherein the measurement device performs measurement while the liquid is present on the upper surface of the light-transmissive member.  
   
   
       20 . The exposure apparatus in accordance with  claim 10 , wherein the light-transmissive member is provided at a peripheral edge of the stage apparatus.  
   
   
       21 . The exposure apparatus in accordance with  claim 10 , wherein a holding part for holding the liquid is provided on an upper surface of the light-transmissive member.  
   
   
       22 . The exposure apparatus in accordance with  claim 10 , wherein a recessed or protruding part for holding the liquid is provided on an upper surface of the light-transmissive member.  
   
   
       23 . The exposure apparatus in accordance with  claim 10 , wherein an upper surface of the light-transmissive member is liquid-repellent.  
   
   
       24 . The exposure apparatus in accordance with  claim 10 , wherein an upper surface of the light-transmissive member and an upper surface of the substrate disposed on the stage apparatus are substantially the same height.  
   
   
       25 . The exposure apparatus in accordance with  claim 19 , wherein the upper surface of the light-transmissive member and an upper surface of the stage apparatus have substantially the same height.  
   
   
       26 . The exposure apparatus in accordance with  claim 10 , wherein the stage apparatus has a first stage for holding the substrate and a second stage provided independently of the first stage, and the light-transmissive member is provided at the second stage.  
   
   
       27 . A device fabrication method for fabricating a device using an exposure apparatus in accordance with  claim 1.