Exposure apparatus, exposure method, and method for producing device

Abstract

A device manufacturing method includes the steps of providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by the substrate, the non-radiation sensitive material being at least partially transparent to radiation and being of a different material than the immersion liquid, the non-radiation sensitive material being provided over at least a part of a radiation sensitive layer of the substrate; and projecting a patterned beam of radiation, through the immersion liquid, onto a target portion of the substrate using the projection system.

1 . A device manufacturing method comprising: 
 providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by said substrate, said non-radiation sensitive material being at least partially transparent to radiation and being of a different material than said immersion liquid, said non-radiation sensitive material being provided over at least a part of a radiation sensitive layer of said substrate; and    projecting a patterned beam of radiation, through said immersion liquid, onto a target portion of said substrate using said projection system.    
   
   
       2 . A method according to  claim 1 , wherein said non-radiation sensitive material is substantially insoluble in and unreactive with said immersion liquid.  
   
   
       3 . A method according to  claim 1 , further comprising at least partly coating said radiation sensitive layer of said substrate with said non-radiation sensitive material.  
   
   
       4 . A substrate for use in a lithographic projection apparatus, the substrate being at least partly covered by a radiation sensitive layer, the radiation sensitive layer being at least partly covered with a non-radiation sensitive material which is at least partly transparent to said radiation and being of a different material than an immersion liquid through which a patterned beam of said radiation of the lithographic projection apparatus is projected onto a target portion of said substrate.  
   
   
       5 . A substrate according to  claim 4 , wherein said non-radiation sensitive material is substantially insoluble in and unreactive with said immersion liquid.