US2006270216A1PendingUtilityA1
Phase change memory cell defined by a pattern shrink material process
Est. expiryApr 8, 2025(expired)· nominal 20-yr term from priority
Inventors:Thomas Happ
H10N 70/066H10N 70/068H10N 70/231H10N 70/884H10N 70/8828G11C 13/0004H10N 70/826H10N 70/8413
50
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Claims
Abstract
One embodiment of the present invention provides a memory cell device. The memory cell device includes a first electrode, a phase-change material adjacent the first electrode, and a second electrode adjacent the phase-change material. The phase-change material has a sublithographic width defined by a pattern shrink material process.
Claims
exact text as granted — not AI-modified1 . A memory cell device comprising:
a first electrode; a phase-change material adjacent the first electrode, the phase-change material having a sublithographic width defined by a pattern shrink material process; and a second electrode adjacent the phase-change material.
2 . The memory cell device of claim 1 , wherein the pattern shrink material process comprises a SAFIER™ material process.
3 . The memory cell device of claim 1 , wherein the pattern shrink material process comprises a RELACS™ material process.
4 . The memory cell device of claim 1 , wherein the phase-change material comprises a chalcogenide.
5 . The memory cell device of claim 1 , further comprising:
an isolation material adjacent the phase-change material.
6 . A memory cell device comprising:
a first electrode; a heater adjacent the first electrode, the heater having a sublithographic width defined by a pattern shrink material process; a phase-change material adjacent the heater; and a second electrode adjacent the phase-change material.
7 . The memory cell device of claim 6 , wherein the pattern shrink material process comprises a SAFIER™ material process.
8 . The memory cell device of claim 6 , wherein the pattern shrink material process comprises a RELACS™ material process.
9 . The memory cell device of claim 6 , wherein the phase-change material comprises a chalcogenide.
10 . The memory cell device of claim 6 , further comprising:
an isolation material adjacent the heater.
11 . A memory device comprising:
a write pulse generator for generating a write pulse signal; a sense amplifier for sensing a read signal; a distribution circuit; and a plurality of phase-change memory cells each capable of defining at least a first state and a second state, each memory cell further comprising phase-change material having a sublithographic width defined by a pattern shrink material process.
12 . The memory device of claim 11 , wherein the pattern shrink material process comprises a SAFIER™ material process.
13 . The memory device of claim 11 , wherein the pattern shrink material process comprises a RELACS™ material process.
14 . A memory device comprising:
a write pulse generator for generating a write pulse signal; a sense amplifier for sensing a read signal; a distribution circuit; and a plurality of phase-change memory cells each capable of defining at least a first state and a second state, each memory cell further comprising a heater having a sublithographic width defined by a pattern shrink material process.
15 . The memory device of claim 14 , wherein the pattern shrink material process comprises a SAFIER™ material process.
16 . The memory device of claim 14 , wherein the pattern shrink material process comprises a RELACS™ material process.
17 - 38 . (canceled)
39 . The memory cell device of claim 1 , wherein the phase-change material is cylindrical in shape.
40 . The memory cell device of claim 6 , wherein the heater is cylindrical in shape.
41 . The memroy device of claim 11 , wherein the phase-change material of each memory cell is cylindrical in shape.
42 . The memory device of claim 14 , wherein the heater of each memory cell is cylindrical in shape.Join the waitlist — get patent alerts
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