Antireflection laminate

Abstract

There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

1 . An antireflective laminate comprising a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on said light transparent base material, wherein 
 said low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of said silica fine particles being porous or void, and 
 for a part or all of said silica fine particles, at least a part of the surface of said silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.  
   
   
   
       2 . The antireflective laminate according to  claim 1 , wherein said ionizing radiation curing-type resin composition comprises a compound containing, per molecule, one or more hydrogen bond forming groups and three or more ionizing radiation curing groups.  
   
   
       3 . The antireflective laminate according to  claim 1 , wherein said ionizing radiation curing group is an acryloyl group and/or a methacryloyl group.  
   
   
       4 . The antireflective laminate according to  claim 1 , wherein said silica fine particles have an alkali metal oxide content of not more than 5 ppm.  
   
   
       5 . The antireflective laminate according to  claim 1 , wherein said silica fine particles have an ammonia content of not more than 1500 ppm.  
   
   
       6 . The antireflective laminate according to  claim 1 , wherein said silica fine particles have been subjected to surface treatment with 1 to 50% by weight, based on said silica fine particles, of said silane coupling agent.  
   
   
       7 . The antireflective laminate according to  claim 1 , wherein said silica fine particles have an average diameter of 5 to 100 nm.  
   
   
       8 . The antireflective laminate according to  claim 1 , wherein said outer shell layer in said silica fine particles has a thickness of 1/60 to ⅓ of the average particle diameter of said silica fine particles.  
   
   
       9 . The antireflective laminate according to  claim 1 , wherein said silica fine particles are contained in an amount of 70 to 250 parts by weight based on 100 parts by weight of said ionizing radiation curing-type resin composition.  
   
   
       10 . The antireflective laminate according to  claim 1 , wherein said silica fine particles form a covalent bond directly with said ionizing radiation curing-type resin composition through an ionizing radiation curing group in a silane coupling agent introduced into the surface of said silica fine particles and/or chemically form a covalent bond through ionizing radiation curing group in a free silane coupling agent.  
   
   
       11 . The antireflective laminate according to  claim 1 , wherein said low refractive index layer comprises a fluorocompound and/or a silicocompound which are compatible with both said ionizing radiation curing-type composition and said silica fine particles.  
   
   
       12 . The antireflective laminate according to  claim 1   1 , wherein at least a part of said fluorocompound and/or silicocompound, together with said ionizing radiation curing-type resin composition, form a covalent bond by a chemical reaction.  
   
   
       13 . The antireflective laminate according to  claim 11 , wherein said fluorocompound is selected from the group consisting of compounds containing at least one of perfluoroalkyl, perfluoroalkylene, perfluoroalkyl ether, and perfluoroalkenyl groups, and mixtures of these compounds.  
   
   
       14 . The antireflective laminate according to  claim 11 , wherein said fluorocompound and/or silicocompound are compounds represented by general formula:  
     
       
         
         
             
             
         
       
       wherein Ra represents an alkyl group having 1 to 20 carbon atoms; Rb represents an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, or a polyether modified group, which are unsubstituted or substituted by an amino group, an epoxy group, a carboxyl group, a hydroxyl group, a perfluoroalkyl group, a perfluoroalkylene group, a perfluoroalkyl ether group, or an (meth)acryloyl group; Ra's may be the same or different and Rb's may be the same or different; and m is an integer of 0 to 200 and n is an integer of 0 to 200.  
     
   
   
       15 . The antireflective laminate according to  claim 11 , wherein said fluorocompound and/or silicocompound are compounds represented by general formula: 
       Ra n SiX 4-n   wherein Ra represents a hydrocarbon group having 3 to 1000 carbon atoms containing a perfluoroalkyl group, a perfluoroalkylene group, or a perfluoroalkyl ether group; and X represents an alkoxy or oxyalkoxy group having 1 to 3 carbon atoms or a halogen group; and n is an integer of 1 to 3.    
   
   
       16 . The antireflective laminate according to  claim 11 , wherein said fluorocompound and/or said silicocompound are contained in an amount of 0.01 to 10% by weight based on the total amount of said ionizing radiation curing-type resin composition and said silica fine particles.  
   
   
       17 . The antireflective laminate according to  claim 1 , wherein a hardcoat layer is provided between said base material and said low refractive index layer.  
   
   
       18 . The antireflective laminate according to  claim 1 , wherein said hardcoat layer has a refractive index in the range of 1.57 to 1.70.  
   
   
       19 . The antireflective laminate according to  claim 1 , wherein said hardcoat layer has anti-dazzling properties.  
   
   
       20 . The antireflective laminate according to  claim 1 , wherein an antifouling layer is provided on said low refractive index layer in its side remote from the base material.  
   
   
       21 . The antireflective laminate according to  claim 1 , wherein at least one refractive index layer having a refractive index in the range of 1.46 to 2.00 and a thickness in the range of 0.05 to 0.15 μm is provided between said hardcoat layer and said low refractive index layer.  
   
   
       22 . The antireflective laminate according to  claim 21 , wherein at least one layer selected from the group consisting of said hardcoat layer, said refractive index layer and said low refractive index layer has antistatic properties.  
   
   
       23 . The antireflective laminate according to  claim 16 , wherein an antistatic layer is provided between said base material and said hardcoat layer.  
   
   
       24 . The antireflective laminate according to  claim 1 , wherein said low refractive index layer has a nanoporous structure within and/or on the surface thereof.  
   
   
       25 . The antireflective laminate according to  claim 1 , wherein the low refractive index layer has a thickness in the range of 0.05 to 0.15 μm.  
   
   
       26 . The antireflective laminate according to  claim 17 , wherein the minimum load level which, when the surface of said low refractive index layer is rubbed 10 times with a steel wool of #0000, causes a change in haze of said low refractive index layer, is not less than 200 g.