Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass

Abstract

A chemical vapor deposition process for laying down a tin or titanium oxide coating on a glass substrate through the use of an organic oxygen-containing compound and the corresponding metal tetrachloride. The organic oxygen compound is preferably an ester having an alkyl group with a β hydrogen in order to obtain a high deposition rate. The resulting article has a tin or titanium oxide coating which can be of substantial thickness because of the high deposition rates attainable with the novel process, and, in the case of titanium oxide coating possesses a desirable refractive index greater than 2.4. The coating growth rates resulting from the method of the present invention may be at least 130 Å per second.

1 - 32 . (canceled)  
     
     
         33 . A titanium dioxide photocatalyst structure comprising: 
 a transparent glass substrate having first and second opposing surfaces, said transparent glass substrate containing alkaline ingredients therein, the first surface of said substrate receiving light from an external light source;    a titanium dioxide film having first and second opposing surfaces, a light transmittance of said titanium dioxide film being at least 50% for light having a wavelength of 550 nm, the first surface of said titanium dioxide film being formed on the second surface of said substrate, whereby light transmitted from said external source through the first and second opposing surfaces of said substrate and through the first surface of said titanium dioxide film to the second surface thereof causes photocatalytic activity to be generated on the second surface of said titanium dioxide film; and    a transparent precoat film interposed between the second surface of said substrate and the first surface of said titanium dioxide film.    
     
     
         34 . The titanium dioxide photocatalyst structure according to  claim 33 , wherein said transparent precoat film has a thickness of 0.02 μm to 0.2 μm.  
     
     
         35 . The titanium dioxide photocatalyst structure according to  claim 34 , wherein said precoat film is composed of SiO 2 .  
     
     
         36 . A titanium dioxide photocatalyst structure comprising: 
 a transparent substrate;    a titanium dioxide film formed on said substrate, said titanium dioxide film having photocatalytic activity and a light transmittance of at least 50% for light having a wavelength of 550 nm; and    a transparent precoat film disposed between the transparent substrate and the titanium dioxide film.    
     
     
         37 . The titanium dioxide photocatalyst structure according to  claim 36 , wherein the precoat film has a thickness of 0.02 μm to 0.2 μm.  
     
     
         38 . The titanium dioxide photocatalyst structure according to  claim 36 , wherein the precoat film is composed of SiO 2 .  
     
     
         39 . A method for producing a titanium dioxide photocatalyst structure according to  claim 36  comprising a producing process which includes the step of forming the titanium dioxide film on the transparent substrate by a method selected from the group consisting of a pyro-sol method, a dipping method, a printing method and a CVD method.  
     
     
         40 . A titanium dioxide photocatalyst structure comprising: 
 a transparent substrate;    a titanium dioxide film formed on said substrate, said titanium dioxide film having a thickness of 0.1 μm to 5 μm, photocatalytic activity and a light transmittance of at least 50% for light having a wavelength of 550 nm; and    a transparent precoat film disposed between the transparent substrate and the titanium dioxide film.    
     
     
         41 . The titanium dioxide photocatalyst structure according to  claim 40 , wherein the precoat film has a thickness of 0.02 μm to 0.2 μm.  
     
     
         42 . The titanium dioxide photocatalyst structure according to  claim 40 , wherein the precoat film is composed of SiO 2 .  
     
     
         43 . A titanium dioxide photocatalyst structure comprising: 
 a transparent substrate;    a titanium dioxide film, containing an anatase crystal, formed on said substrate, said titanium dioxide film having photocatalytic activity and a light transmittance of at least 50% for light having a wavelength of 550 nm; and    a transparent precoat film disposed between the transparent substrate and the titanium dioxide film.    
     
     
         44 . The titanium dioxide photocatalyst structure according to  claim 43 , wherein the precoat film has a thickness of 0.02 μm to 0.2 μm.  
     
     
         45 . The titanium dioxide photocatalyst structure according to  claim 43 , wherein the precoat film is composed of SiO 2 .