Methods and apparatus for providing fluid to a semiconductor device processing apparatus
Abstract
In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
Claims
exact text as granted — not AI-modified1 . A method of dispensing a fluid, comprising:
providing a valve assembly that includes a first valve, a second valve and a check valve in a single manifold; receiving a chemical in the valve assembly from a chemical supply; receiving deionized (DI) water in the valve assembly from a DI water supply; when the first valve of the valve assembly is closed and the second valve of the valve assembly is open, at least one of outputting the chemical from a chemical-return output of the valve assembly and outputting DI water from a valve assembly output; when the first valve of the valve assembly is open and the second valve of the valve assembly is closed, at least one of outputting the chemical from the valve assembly output and outputting the DI water from a DI-water-return output of the valve assembly; and when the first valve is closed and the second valve is open, preventing DI water in the valve assembly from contaminating the chemical.
2 . The method of claim 1 further comprising reducing a volume of dead legs in the valve assembly.
3 . The method of claim 1 further comprising reducing a number of fittings required to at least one of receive the chemical in the valve assembly and dispense the chemical from the valve assembly.
4 . The method of claim 3 further comprising reducing a number of leakage points in the valve assembly.
5 . The method of claim 1 further comprising reducing a number of dead legs in the valve assembly.
6 . The method of claim 1 further comprising actuating a manual override switch of the first valve to prevent the chemical from being output from the valve assembly output.
7 . A method of dispensing a fluid, comprising:
providing a valve assembly that includes a first valve, a second valve and a check valve in a single manifold; receiving a chemical in the valve assembly from a chemical supply; receiving deionized (DI) water in the valve assembly from a DI water supply; employing the first valve of the valve assembly in a closed position so as to circulate the chemical through a first output of the first valve to a chemical return; and employing the second valve of the valve assembly in an open position so as to dispense DI water from a valve assembly output.
8 . The method of claim 7 further comprising:
employing the first valve of the valve assembly in an open position so as to dispense the chemical from the valve assembly output; and employing the second valve of the valve assembly in a closed position so as to circulate DI water through a deionized-water-return output of the valve assembly.
9 . The method of claim 7 further comprising reducing a volume of dead legs in the valve assembly.
10 . The method of claim 7 further comprising reducing a number of fittings required to at least one of receive the chemical in the valve assembly and dispense the chemical from the valve assembly.
11 . The method of claim 10 further comprising reducing a number of leakage points in the valve assembly.
12 . The method of claim 7 further comprising reducing a number of dead legs in the valve assembly.
13 . A method of dispensing a fluid, comprising:
providing a valve assembly adapted to provide fluid to a semiconductor device processing apparatus, the valve assembly including:
a valve assembly output adapted to output at least one of DI water and a chemical;
a first valve comprising:
a first input adapted to receive the chemical;
a first output adapted to circulate the chemical to a chemical return; and
a second output adapted to output the chemical to the valve assembly output;
a second valve positioned downstream from the first valve comprising:
an input adapted to receive deionized (DI) water; and
an output adapted to output DI water to the valve assembly output; and
a check valve coupled between the second output of the first valve and the output of the second valve;
wherein the first valve, second valve and check valve are included in a single manifold; and
employing the valve assembly to selectively supply the chemical to the semiconductor device processing apparatus.
14 . The method of claim 13 further comprising reducing a volume of dead legs in the valve assembly.
15 . The method of claim 13 further comprising reducing a number of fittings required to at least one of receive the chemical in the valve assembly and dispense the chemical from the valve assembly.
16 . The method of claim 15 further comprising reducing a number of leakage points in the valve assembly.
17 . The method of claim 13 further comprising reducing a number of dead legs in the valve assembly.Join the waitlist — get patent alerts
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