Roller with microstructure and the manufacturing method thereof
Abstract
The present invention discloses a method for manufacturing a roller with microstructure, comprising the steps of: forming a protective metal layer on a roller; defining specific imprint patterns on an imprint stamp by processing the imprint stamp with a flexible mold; forming an etch mask on the embossed imprint stamp after the imprint stamp is released from the mold; wetting the imprint stamp and the etch mask thereof; adhering the etch mask onto the roller by rolling the roller on the imprint stamp; etching the roller at the portion thereof uncovered by the etch mask; and forming the roller with specific microstructure by removing the etch mask and the protective metal layer.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing a roller with microstructure, comprising the steps of:
forming a protective metal layer on a roller; defining specific imprint patterns on an imprint stamp by processing the imprint stamp with a flexible mold having the specific imprint patterns embossed thereon; forming an etch mask on the patterned imprint stamp having imprint patterns complementary to that of the flexible mold; rolling the roller on the patterned stamp for adhering the etch mask of imprint patterns complementary to that of the flexible mold on the roller and thus forming a patterned layer of monomer on the protective metal layer of the roller; etching the roller at the portion thereof uncovered by the etch mask; and forming the roller with specific microstructure by removing the etch mask and the protective metal layer.
2 . The method of claim 1 , wherein the etch mask is a layer having a complementary image of the specific imprint patterns of the flexible mold.
3 . The method of claim 2 , wherein the layer is made of a monomer.
4 . The method of claim 3 , wherein the monomer is the Self-Assembly Mononer (SAM).
5 . The method of claim 1 , wherein the flexible mold is made of Polydimethyl Siloxane (PDMS).
6 . A roller with microstructure, forming by the step of:
forming a protective metal layer on the roller; forming an etch mask of specific imprint pattern on the roller by rolling and pressing the roller on an imprint stamp; etching the roller at the portion thereof uncovered by the etch mask; and forming the roller with specific microstructure by removing the etch mask and the protective metal layer.
7 . The roller of claim 5 , wherein the etch mask is a layer having a complementary image of the specific imprint patterns of the imprint stamp.
8 . The roller of claim 6 , wherein the layer is made of a monomer.
9 . The roller of claim 5 , wherein the roller is applied in the manufacturing of flexible printed circuit board.Join the waitlist — get patent alerts
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