Management system, management apparatus, management method, and device manufacturing method

Abstract

A management system including an acquisition device for acquiring actual processing results obtained by operating an industrial device with a set parameter value and another parameter value, and an estimated processing result, an inspection device for inspecting the processing result obtained with the set parameter value, and acquiring and accumulating an inspection result value, a change device for changing the set parameter value on the basis of the processing results acquired by the acquisition device and the inspection result value obtained by the inspection device, an evaluation device for evaluating a variation state of the processing results on the basis of an inspection result value accumulated by the inspection device, and a decision device for deciding, on the basis of an evaluation result by the evaluation device, a frequency at which the acquisition device is executed.

1 . A management system which manages an industrial device, comprising a function of changing a frequency of inspection operation for changing a predetermined parameter value.  
   
   
       2 . The system according to  claim 1 , wherein the frequency of the inspection operation is changed on the basis of a result of the inspection operation.  
   
   
       3 . The system according to  claim 1 , wherein the frequency of the inspection operation is changed on the basis of at least either of an error cycle and error variations in the inspection operation.  
   
   
       4 . The system according to  claim 1 , wherein the frequency of the inspection operation is decided on the basis of a statistical result of the inspection operation.  
   
   
       5 . The system according to  claim 1 , wherein the frequency is decided when an inspection result is decided to become stable.  
   
   
       6 - 17 . (canceled)  
   
   
       18 . The system according to  claim 1 , wherein the industrial device includes a semiconductor exposure.  
   
   
       19 . The system according to  claim 18 , wherein the predetermined parameter includes a parameter for aligning a wafer in the semiconductor exposure apparatus.  
   
   
       20 . A device manufacturing method of manufacturing a device by an industrial device managed by a management system defined in  claim 1 .  
   
   
       21 . A method of controlling a management apparatus which manages an industrial device and an inspection apparatus for inspecting a processing result by the industrial device, comprising 
 a step of changing a frequency of inspection operation of the inspection apparatus for changing a predetermined parameter value in the industrial device.    
   
   
       22 . A storage medium which stores a control program for causing a computer to execute a control method defined in  claim 21 .  
   
   
       23 . A control program which causes a computer to execute a control method defined in  claim 21.