Electrode in a measurement tube of a magnetic-inductive flowmeter

Abstract

Electrode in an internally lined measurement tube of a magnetic-inductive flowmeter, having an electrically conductive mount which can be loaded mechanically, characterized in that the mount is provided at least on its side facing the measurement tube interior with a multilayer film, comprising at least one first electrically conductive thin film composed of an element of the first or the eighth group in the fourth, fifth or sixth period of the periodic table of the elements, as well as a second electrically conductive thin film, which covers the first thin film and has good resistance to abrasion and corrosion.

1 . Electrode in an internally lined measurement tube of a magnetic-inductive flowmeter, having an electrically conductive mount which can be loaded mechanically, wherein the mount is provided at least on its side facing the measurement tube interior with a multilayer film, comprising at least one first electronically conductive thin film composed on an element of the first or the eighth group in the fourth, fifth or sixth period of the periodic table of the elements, as well as a second electrically conductive thin film, which covers the first thin film and has good resistance to abrasion and corrosion.  
     
     
         2 . Electrode according to  claim 1  wherein the first thin film is composed of platinum or gold.  
     
     
         3 . Electrode according to,  claim 1 , wherein the second thin film composed of an electrically conductive ceramic.  
     
     
         4 . Electrode according to  claim 1 , wherein the second thin film composed of aluminum titanium nitride (AlTiN) or titanium nitride (TiN).  
     
     
         5 . Electrode according to  claim 1 , wherein the material of the first thin film is applied to the mount by vapour deposition, sputtering, laser ablation, electrochemical deposition, chemical vapour deposition (CVD) or epitaxially.  
     
     
         6 . Electrode according to  claim 1 , wherein the material of the second thin film is applied to the first thin film by vapour deposition, sputtering, electrochemical deposition or by chemical vapour deposition (CVD).  
     
     
         7 . Electrode according to  claim 1 , comprising a mount composed of stainless steel.  
     
     
         8 . Electrode according to  claim 1 , which is fitted in a hermetically sealed form into the internal lining of the measurement tube.  
     
     
         9 . Electrode according to  claim 2 , wherein the material of the first thin film is applied to the mount by vapour deposition, sputtering, laser ablation, electrochemical deposition, chemical vapour deposition (CVD) or epitaxially.  
     
     
         10 . Electrode according to  claim 9 , wherein the material of the second thin film is applied to the first thin film by vapour deposition, sputtering, electrochemical deposition or by chemical vapour deposition (CVD).  
     
     
         11 . Electrode according to  claim 10 , comprising a mount composed of stainless steel.  
     
     
         12 . Electrode according to  claim 11 , which is fitted in a hermetically sealed form into the internal lining of the measurement tube.