Illumination apparatus, projection exposure apparatus, and device fabricating method

Abstract

An exposure apparatus having an exposure mode that transfers a pattern on a reticle onto an object, and a standby mode that waits for exposure includes an optical system for introducing the exposure light to the object in the exposure mode, and a mechanism for allowing the exposure light to enter the reticle and/or the optical system in the standby mode, and for preventing the exposure light from entering the object in the standby mode.

1 . A chuck that fixes an object to be exposed, onto which a pattern on a reticle is exposed, said chuck comprising a contact part that contacts and fixes the objects, a contact ratio of the contact part being 20% or smaller on a surface of object which contacts the contact part.  
   
   
       2 . An exposure apparatus for exposing a pattern on a reticle onto an object, said exposure apparatus comprising a chuck for fixing the object, the chuck including a contact part that contacts and fixes the object, wherein a contact ratio of the contact part is 20% or smaller on a surface of object which contacts the contact part.