Exposure apparatus and optical component for the same

Abstract

In an exposure apparatus, a light source emits ultraviolet light having a wavelength of 300 nm or less, a homogenizer reduces energy density inhomogeneity of the ultraviolet light in a plane perpendicular to an optical axis, and an exposure object is exposed by applying the ultraviolet light passed through a plurality of optical components. At least one of the plurality of optical components is a synthetic silica glass component, and all the synthetic silica glass component is placed closer to the exposure object than is the homogenizer placed closest to the light source.

1 . An exposure apparatus which comprises: a light source emitting ultraviolet light having a wavelength of 300 nm or less; and a homogenizer reducing energy density inhomogeneity of the ultraviolet light in a plane perpendicular to an optical axis, and which exposes an exposure object by applying the ultraviolet light passed through a plurality of optical components, 
 wherein at least one of the plurality of optical components is a synthetic silica glass component, and all the synthetic silica glass component is placed closer to the exposure object than the homogenizer placed closest to the light source is.