Exposure apparatus and optical component for the same

Abstract

In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. In ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.

1 . An exposure apparatus which comprises a light source emitting ultraviolet light having a wavelength of 300 nm or less and which exposes an exposure object to light by applying the ultraviolet light passed through a plurality of optical components, 
 wherein at least one of the plurality of optical components is a synthetic silica glass component; and, in ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.