Very low moisture o-ring and method for preparing the same

Abstract

Very low moisture o-rings are prepared by placing standard o-rings under vacuum in an inert atmosphere for a period of time sufficient to achieve a desired outgassing rate. Heat is not applied. While the o-rings are under vacuum, moisture is removed from the o-rings via diffusion transport.

1 . A moisture-depleted o-ring prepared by: 
 a) calculating an amount of time required for an o-ring of known dimensions to be placed under vacuum to achieve a desired outgassing rate;    b) placing the o-ring under vacuum for the calculated amount of time, wherein moisture in the o-ring is depleted while it is under vacuum; and    c) removing the moisture-depleted o-ring from under vacuum when the calculated amount of time has expired.    
   
   
       2 . The o-ring of  claim 1  further prepared by placing the o-ring in an inert atmosphere while it is under vacuum.  
   
   
       3 . The o-ring of  claim 1  wherein the o-ring is not heated while it is under vacuum.  
   
   
       4 . A moisture-depleted o-ring prepared by: 
 a) calculating an amount of time required for an o-ring of known dimensions to be placed under vacuum to achieve a desired outgassing rate;    b) placing the o-ring under vacuum for the calculated amount of time, wherein moisture in the o-ring is depleted while it is under vacuum and the o-ring is not heated while it is under vacuum; and    c) removing the moisture-depleted o-ring from under vacuum when the calculated amount of time has expired.    
   
   
       5 . The o-ring of  claim 4  further prepared by placing the o-ring in an inert atmosphere while it is under vacuum.