US2006139561A1PendingUtilityA1
Mold for forming spacers for flat panel displays
Individually held — no corporate assignee on recordPriority: Apr 26, 2000Filed: Feb 17, 2006Published: Jun 29, 2006
Est. expiryApr 26, 2020(expired)· nominal 20-yr term from priority
B29C 33/3857C09K 2323/05H01J 2211/36G03F 7/0017G02F 1/1339G02F 1/13394
56
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Claims
Abstract
The present invention describes thick film photolithographic molds, methods of making thick film photolithographic molds, and methods of using thick film photolithographic molds to form spacers on a substrate. The thick film photolithographic molds preferably comprise an epoxy bisphenol A novolac resin. The present invention also describes sol gel spacers comprising sodium silicates and potassium silicates. The thick film photolithographic molds and sol gel spacers of the present invention can be used in flat panel displays, such as field emission displays and plasma displays.
Claims
exact text as granted — not AI-modified1 . A method for adjusting the adhesion between a support and a photolithographic material comprising:
providing a support; applying a priming agent to the support; preparing a composition comprising a photolithographic material; and applying the composition on the support.
2 . The method of claim 1 , wherein the priming agent comprises at least one polyol.
3 . The method of claim 2 , wherein the at least one polyol is triethanol amine or ethylene glycol.
4 . The method of claim 1 , wherein the priming agent is a silane bonding agent.
5 . The method of claim 4 , wherein the silane bonding agent comprises a silane, a cyclohexane and an epoxy group.
6 . The method of claim 4 , wherein the silane bonding agent is 2(3,4-epoxycyclohexyl)ethyltrimethoxysilane.
7 . The method of claim 1 , wherein the priming agent is at least one of phosphoric acid, hydrochloric acid, NH 4 OH, KOH, HF, and NH 4 OH:H 2 O 2 .
8 . The method of claim 1 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
9 . The method of claim 8 , wherein the epoxy bisphenol A novolac resin is SU-8.
10 . The method of claim 8 , wherein the photolithographic material further comprises a cross-linking agent.
11 . A method for forming a negative mold for forming spacers on a flat panel display comprising:
providing a positive mold comprising at least one post and a photolithographic material; covering the positive mold with a composition; allowing the composition to harden; and removing the positive mold to reveal the negative mold comprising the hardened composition.
12 . The method of claim 11 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
13 . The method of claim 12 , wherein the epoxy bisphenol A novolac resin is SU-8.
14 . The method of claim 12 , wherein the photolithographic material further comprises a cross-linking agent.
15 . The method of claim 11 , wherein the composition comprises latex.
16 . A mold for forming spacers on a flat panel display prepared by the process comprising:
adding a dry photolithographic material to a mixture comprising a solvent and a photoinitiator; applying the mixture to a support; heating the mixture until the mixture forms a flowable composition on the support; applying a photomask over the composition; curing exposed portions of the composition; and removing un-cured portions of the composition to reveal the mold.
17 . The mold of claim 16 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
18 . The mold of claim 17 , wherein the epoxy bisphenol A novolac resin is SU-8.
19 . The mold of claim 17 , wherein the photolithographic material further comprises a cross-linking agent.
20 . The mold of claim 16 , wherein the photolithographic material is present in an amount of 200 to 600 parts by weight, wherein the solvent is present in an amount of 200 to 600 parts by weight, and wherein the photoinitiator is present in an amount of about 1 to 100 parts by weight.
21 . The mold of claim 16 , further comprising priming the support with a priming agent prior to applying the mixture on the support.
22 . The mold of claim 21 , wherein the priming agent comprises at least one polyol.
23 . The mold of claim 21 , wherein the priming agent comprises at least one of triethanol amine, ethylene glycol, 2(3,4-epoxycyclohexyl)ethyltrimethoxysilane, phosphoric acid, hydrochloric acid, NH 4 OH, KOH, HF, and NH 4 OH:H 2 O 2 .
24 . A method for forming a mold comprising:
providing a support; placing alignment marks on the support; applying a thick film photolithographic material on the support, wherein the thick film photolithographic material is positioned within the alignment marks on the support; and curing the thick film photolithographic material to form the mold.
25 . The method of claim 24 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
26 . The method of claim 25 , wherein the epoxy bisphenol A novolac resin is SU-8.
27 . The method of claim 25 , wherein the photolithographic material further comprises a cross-linking agent.
28 . The method of claim 24 , further comprising priming the support with a priming agent prior to applying the thick film photolithographic material on the support.
29 . A method for forming a mold comprising:
providing a support; placing alignment marks on the support; applying a transparent photolithographic material over the support; placing a photomask on the photolithographic material, wherein the photomask is positioned within the alignment marks on the support; curing the photolithographic material; and removing the un-cured photolithographic material to reveal the mold.
30 . The method of claim 29 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
31 . The method of claim 30 , wherein the epoxy bisphenol A novolac resin is SU-8.
32 . The method of claim 30 , wherein the photolithographic material further comprises a cross-linking agent.
33 . The method of claim 29 , further comprising priming the support with a priming agent prior to applying the transparent photolithographic material on the support.
34 . A method of forming at least one spacer on a substrate comprising:
applying a negative mold on a substrate, wherein the negative mold comprises a photolithographic material, and at least one hole; applying a spacer material to the negative mold, wherein the spacer material fills the at least one hole; hardening and bonding the spacer material to the substrate; and removing the negative mold from the substrate, wherein the hardened spacer material remains bonded to the substrate.
35 . The method of claim 34 , wherein the method is performed in a vacuum.
36 . The method of claim 34 , wherein the photolithographic material comprises an epoxy bisphenol A novolac resin.
37 . The method of claim 36 , wherein the epoxy bisphenol novolac resin is SU-8.
38 . The method of claim 34 , wherein the spacer material comprises a sodium silicate and a potassium silicate.
39 . The method of claim 34 , wherein the substrate is a faceplate or a baseplate of a flat panel display.
40 . A method of forming a spacer on a substrate comprising:
preparing a mold comprising at least one hole; filling the at least one hole in the mold with a spacer material; contacting the mold with a substrate; allowing the spacer material to harden and bond to the substrate; and removing the mold from the substrate, wherein the hardened spacer material remains bonded to the substrate.
41 . The method of claim 40 , wherein the spacer material comprises a sodium silicate and a potassium silicate.
42 . The method of claim 40 , wherein the substrate is a faceplate or a baseplate of a flat panel display.
43 . A spacer for a flat panel display comprising sodium silicate and potassium silicate.
44 . A method for preparing a spacer for a flat panel display comprising:
preparing a composition comprising formamide, potassium silicate and sodium silicate; allowing the composition to form a gel; and firing the gel to produce the spacer.
45 . A flat panel display comprising:
a faceplate; a baseplate; and at least one spacer between the faceplate and the baseplate, wherein the spacer comprises a sodium silicate and a potassium silicate.
46 . A method of forming spacers on a display comprising:
providing a resilient negative mold, the negative mold comprising a first layer and a second layer, the first layer being characterized by a first durometer, the second layer being characterized by a second durometer, the second durometer being higher than the first durometer, the first layer defining a plurality of apertures and a plurality of vacuum pump-out channels; placing the negative mold in contact with a substrate; using the vacuum pump-out channels to remove gas from between the substrate and the negative mold; filling the apertures with a spacer material; allowing some of the spacer material to cure and to become attached to the substrate; and separating the substrate from the negative mold.
47 . The method according to claim 46 , wherein the negative mold comprises an alignment sheet, the alignment sheet defining at least two alignment apertures.
48 . The method according to claim 47 , wherein the alignment sheet is metallic.Join the waitlist — get patent alerts
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