Partial edge bead removal to allow improved grounding during e-beam mask writing

Abstract

A method to provide a ground point for second, or subsequent, e-beam mask-writing steps by selectively removing the photoresist edge bead of a photomask substrate to expose the underlying chrome layer. The selective removal leaves at least one tab of photoresist edge bead over the chrome layer. After the first e-beam mask writing step and subsequent etch, the tab can be removed to expose a portion of the chromium layer that can act as a new ground point for a second e-beam etch. Also, a nozzle for use in selectively removing the edge bead to leave a tab of photoresist edge bead.

1 . A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising: 
 a first means to apply and remove a solvent for the material, the first means being adapted to apply and remove the solvent to the top surface of the workpiece adjacent to the periphery;    a second means to apply and remove the solvent, the second means being adapted to apply and remove the solvent to the edge of the workpiece; and    a third means to apply and remove the solvent, the third means being adapted to apply and remove the solvent to the bottom surface of the workpiece adjacent to the periphery,    wherein each means to apply and remove the solvent may be independently controlled.    
   
   
       2 . The nozzle tool according to  claim 1 , wherein the material is metallic.  
   
   
       3 . The nozzle tool according to  claim 1 , wherein the material is a photoresist material layer.  
   
   
       4 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a first nozzle configured to apply and remove a solvent to a top surface of the photomask plate;    a second nozzle configured to apply and remove a solvent from the edge of the photomask plate; and    a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,    wherein each nozzle may be independently controlled.    
   
   
       5 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;    a second nozzle and vacuum means configured to apply and remove a solvent from the edge of the photomask plate; and    a third nozzle and vacuum means configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,    wherein each nozzle may be independently controlled.    
   
   
       6 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;    a second nozzle configured to apply and remove a solvent from the edge of the photomask plate; and    a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,    wherein each nozzle may be independently controlled.    
   
   
       7 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;    a second nozzle and vacuum means configured to apply and remove a solvent from the edge of the photomask plate; and    a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,    wherein each nozzle may be independently controlled.    
   
   
       8 . A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising: 
 a first nozzle and vacuum means adapted to apply and remove a solvent to the top surface of the workpiece adjacent to the periphery;    a second nozzle and vacuum means adapted to apply and remove a solvent to the edge of the workpiece;    a third nozzle and vacuum means adapted to apply and remove a solvent to the bottom surface of the workpiece adjacent to the periphery,    wherein each nozzle is independently controlled by means of a control valve.    
   
   
       9 . A photomask layer removal tool configured to remove a photoresist layer from the photomask, wherein the tool comprises: 
 a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask;    a nozzle and vacuum means configured to apply and remove a solvent to a surface of the photomask plate.    
   
   
       10 . The photomask layer removal tool according to  claim 9 , wherein the tool has two or more nozzles and vacuum means.  
   
   
       11 . The photomask layer removal tool according to  claim 10 , wherein the two or more nozzles and vacuum means can be independently controlled.  
   
   
       12 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask; and    a nozzle and vacuum means, wherein the tool is capable of removing an edge bead from a photomask plate.    
   
   
       13 . The tool according to  claim 12 , further comprising an edge bead removal solution supply, wherein edge bead removal solution flows from the solution supply through the nozzle.  
   
   
       14 . The tool according to  claim 13 , wherein the removal solution is capable of removing a photoresist layer from the photomask plate.  
   
   
       15 . A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising: 
 a first means to apply and remove a solvent for the material, the first means being adapted to apply and remove the solvent to the top surface of the workpiece adjacent to the periphery;    a second means to apply and remove the solvent, the second means being adapted to apply and remove the solvent to the edge of the workpiece; and    a third means to apply and remove the solvent, the third means being adapted to apply and remove the solvent to the bottom surface of the workpiece adjacent to the periphery.    
   
   
       16 . A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises: 
 a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask; and    a nozzle and vacuum means integral to the tool,    wherein the tool is configured to apply and remove a solvent selectively to the top surface, bottom surface and edge to dissolve a material from portions of the photomask adjacent to the periphery to expose a chrome layer of the photomask while leaving at least one tab of photoresist material covering the chrome layer adjacent to the periphery.    
   
   
       17 . A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising: 
 a nozzle to apply and remove a solvent for the material,    wherein the tool is capable of applying and removing a solvent selectively to the top surface, bottom surface and edge to dissolve a photoresist material from portions of the workpiece adjacent to the periphery to expose a chrome layer while leaving at least one tab of the photoresist material covering the chrome layer adjacent to the periphery.    
   
   
       18 . A nozzle tool according to  claim 17 , wherein the tool is configured to remove the exposed chrome layer and a tab of photoresist material.  
   
   
       19 . A nozzle tool according to  claim 18 , wherein the tool comprises two or more nozzles.  
   
   
       20 . A nozzle tool according to  claim 18 , further comprising a vacuum means, wherein the vacuum means is configured to remove the solvent.  
   
   
       21 . A nozzle tool according to  claim 19 , further comprising a plurality of control valves, wherein at least one control valve corresponds to each of the two or more nozzles, wherein the two or more nozzles can be independently controlled by means of the plurality of control valves.  
   
   
       22 . A nozzle tool according to  claim 20 , wherein the vacuum means is located on a trailing edge of the nozzle tool.